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Showing items 1-4 of 4 (1 Page(s) Totally)
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| 國立交通大學 |
2014-12-08T15:46:44Z |
Improvement of ultra-thin 3.3 nm thick oxide for co-salicide process using NF3 annealed poly-gate
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Chang, TY; Lei, TF; Chao, TS; Huang, CT; Chen, SK; Tuan, A; Chou, S |
| 國立交通大學 |
2014-12-08T15:45:23Z |
Low contact resistance of poly-plug structure by in-situ HF-vapour cleaning
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Chen, JH; Lei, TF; Chao, TS; Su, TP; Huang, SJ; Tuan, A; Chen, SK |
| 國立交通大學 |
2014-12-08T15:42:06Z |
Impact of nitrogen and/or fluorine implantation on deep-submicron Co-salicide process
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Chang, TY; Lei, TF; Chao, TS; Chen, SW; Kao, LM; Chen, SK; Tuan, A; Su, TP |
| 國立交通大學 |
2014-12-08T15:01:22Z |
Stabilizing dielectric constant of fluorine-doped SiO2 film by N2O and NH3 plasma post-treatment
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Mei, YJ; Chang, TC; Chang, SJ; Pan, FM; Chen, MSK; Tuan, A; Chou, S; Chang, CY |
Showing items 1-4 of 4 (1 Page(s) Totally)
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