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Showing items 1-2 of 2 (1 Page(s) Totally) 1 View [10|25|50] records per page
國立交通大學 |
2020-05-05T00:02:26Z |
Improved TDDB Reliability and Interface States in 5-nm Hf0.5Zr0.5O2 Ferroelectric Technologies Using NH3 Plasma and Microwave Annealing
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Wu, Tian-Li; Hu, Chenming; Yang, Ting-Hsin; Chen, Yi-Hsuan; Su, Chun-Jung |
國立交通大學 |
2020-04-01 |
Impact of the polarization on time-dependent dielectric breakdown in ferroelectric Hf0.5Zr0.5O2 on Ge substrates
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Wu, Tian-Li; Wang, Yu-Shun; Kao, Kuo-Hsing; Lee, Yao-Jen; Su, Chun-Jung; Yang, Ting-Hsin |
Showing items 1-2 of 2 (1 Page(s) Totally) 1 View [10|25|50] records per page
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