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教育部委托研究计画 计画执行:国立台湾大学图书馆
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显示项目 711061-711070 / 2348973 (共234898页)
<< < 71102 71103 71104 71105 71106 71107 71108 71109 71110 71111 > >>
每页显示[10|25|50]项目
| 國立交通大學 |
2014-12-12T02:11:24Z |
Reactive ion etching of InP and InGaP using CH□/H□mixtures
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陳昶儒; Chen, Chang-Ru; 張國明; Zhang, Guo-Ming |
| 中原大學 |
1999 |
Reactive Ion Etching of Ir Films with a TiN Mask in Ar/O2/BCl3 Helicon Wave Plasma
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T.C.Wei;M.C.Chiang;F.M.Pan;T.P.Liu;B.T.Dai;H.C.Chien; |
| 中原大學 |
1992 |
Reactive ion etching of polyimidesiloxanes in fluorine-containing discharges
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S. Jeng;H.S. Kwok;J.A. Tyrell |
| 國立成功大學 |
1999-07-15 |
Reactive ion etching of Si SiGe in CF4/Ar and Cl-2/BCl3/Ar discharges
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Chang, Shoou-Jinn; Juang, Y. Z.; Nayak, D. K.; Shiraki, Y. |
| 國立成功大學 |
2000-06 |
Reactive ion etching of ZnSe, ZnSSe, ZnCdSe and ZnMgSSe by H-2/Ar and CH4/H-2/Ar
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Chen, W. R.; Chang, Shoou-Jinn; Su, Yan-Kuin; Lan, Wen-How; Lin, A. C. H.; Chang, H |
| 國立成功大學 |
2007-03 |
Reactive ion etching technique for via-hole applications in thick GaAs wafers
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Wang, Chih-Cheng; Lin, Yu-Lu; Lin, Shun-Kuan; Li, Chun-Sheng; Huang, Hou-Kuei; Wu, Chang-Luen; Chang, Chian-Sern; Wang, Yeong-Her |
| 國立交通大學 |
2014-12-08T15:45:10Z |
Reactive ion pretreatment technique to improve the ashing resistance of low dielectric constant high carbon content polymer
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Chang, KM; Yang, JY; Chang, YH; Tsai, JY |
| 國立成功大學 |
2019-03-15 |
Reactive magnetron sputter-deposited TiNxOy multilayered solar selective coatings
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Li;Cho-Yen;Sari;Indah, Fitri Nur;Ting;Jyh-Ming |
| 國立成功大學 |
2000-08 |
Reactive magnetron sputtering of indium tin oxide films on acrylics - Electrical resistivity and optical properties
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Huang, Jow-Lay; Jah, Yin-Tsan; Chen, Ching-Yun; Yau, Bao-Shun; Lin, Su-Shia |
| 國立成功大學 |
2000-07-17 |
Reactive magnetron sputtering of indium tin oxide films on acrylics morphology and bonding state
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Huang, Jow-Lay; Jah, Yin-Tsan; Yau, Bao-Shun; Chen, Ching-Yun; Lu, Horng-Hwa |
显示项目 711061-711070 / 2348973 (共234898页)
<< < 71102 71103 71104 71105 71106 71107 71108 71109 71110 71111 > >>
每页显示[10|25|50]项目
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