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"fahn fj"
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| 國立交通大學 |
2014-12-08T15:02:13Z |
Comprehensive study of plasma pretreatment process for thin gate oxide (<10 nm) fabricated by electron cyclotron resonance plasma oxidation
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Chang, KM; Li, CH; Fahn, FJ; Yeh, TH; Wang, SW |
| 國立交通大學 |
2014-12-08T15:02:10Z |
The influence of precleaning process on the gate oxide film fabricated by electron cyclotron resonance plasma oxidation
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Chang, KM; Li, CH; Fahn, FJ; Tsai, JY; Yeh, TH; Wang, SW; Yang, JY |
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