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"fang yean kuen"的相關文件
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| 國立成功大學 |
2012-02 |
Dependence of the Au/SnOx/n-LTPS/glass thin film MOS Schottky diode CO gas sensing performances on operating temperature
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Juang, Feng-Renn; Fang, Yean-Kuen; Chiu, Hung-Yu |
| 國立成功大學 |
2011-10 |
A Low-Flicker Noise Gate-Controlled Lateral-Vertical Bipolar Junction Transistor Array With 55-nm CMOS Technology
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Chen, Shuo-Mao; Fang, Yean-Kuen; Juang, Feng-Renn; Chen, Chia-Chung; Liu, Sally; Kuo, Chin-Wei; Chao, Chih-Ping; Tseng, Hua-Chou |
| 國立成功大學 |
2011-08-10 |
The low temperature polysilicon (LTPS) thin film MOS Schottky diode on glass substrate for low cost and high performance CO sensing applications
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Juang, Feng-Renn; Fang, Yean-Kuen; Chiang, Yen-Ting; Chou, Tse-Heng; Lin, Cheng-I.; Lin, Cheng-Wei |
| 國立成功大學 |
2011-05 |
Comparative Study of Carbon Monoxide Gas Sensing Mechanism for the LTPS MOS Schottky Diodes With Various Metal Oxides
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Juang, Feng-Renn; Fang, Yean-Kuen; Chiang, Yen-Ting; Chou, Tse-Heng; Lin, Cheng-I; Lin, Cheng-Wei; Liou, Yan-Wei |
| 國立高雄大學 |
2011-03 |
The Improvement of High-k/Metal Gate pMOSFET Performance and Reliability Using Optimized Si Cap/SiGe Channel Structure
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Yeh, Wen-Kuan; Chen, Yu-Ting; Huang, Fon-Shan; Hsu, Chia-Wei; Chen, Chun-Yu; Fang, Yean-Kuen; Gan, Kwang-Jow; Chen, Po-Ying |
| 國立成功大學 |
2011-03 |
The Improvement of High-k/Metal Gate pMOSFET Performance and Reliability Using Optimized Si Cap/SiGe Channel Structure
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Yeh, Wen-Kuan; Chen, Yu-Ting; Huang, Fon-Shan; Hsu, Chia-Wei; Chen, Chun-Yu; Fang, Yean-Kuen; Gan, Kwang-Jow; Chen, Po-Ying |
| 國立成功大學 |
2011-03 |
A Novel Method to Improve Laser Anneal Worsened Negative Bias Temperature Instability in 40-nm CMOS Technology
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Chen, Ming-Shing; Fang, Yean-Kuen; Juang, Feng-Renn; Chiang, Yen-Ting; Lin, Cheng-I; Lee, Tung-Hsing; Chou, Sam; Ning, Judy |
| 國立成功大學 |
2011-01 |
A High-Performance n-i-p SiCN Homojunction for Low-Cost and High-Temperature Ultraviolet Detecting Applications
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Juang, Feng-Renn; Fang, Yean-Kuen; Chiang, Yen-Ting; Chou, Tse-Heng; Lin, Cheng-I. |
| 國立高雄大學 |
2010 |
Improvement of TDDB reliability, characteristics of HfO2 high-k/metal gate MOSFET device with oxygen post deposition annealing
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Hsu, Chia-Wei; Fang, Yean-Kuen; Yeh, Wen-Kuan; Chen, Chun-Yu; Chiang, Yen-Ting; Juang, Feng-Renn; Lin, Chien-Ting; Lai, Chien-Ming |
| 國立成功大學 |
2009-10 |
The split-gate flash memory with an extra select gate for automotive applications
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Tsair, Yong-Shiuan; Fang, Yean-Kuen; Wang, Yu-Hsiung; Chu, Wen-Ting; Hsieh, Chia-Ta; Lin, Yung-Tao; Wang, Chung S.; Wong, Myron; Lee, Scott; Smolen, Richard; Liu, Bill |
| 國立成功大學 |
2009-08 |
The effects of STI induced mechanical strain on GIDL current in Hf-based and SiON MOSFETs
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Cheng, C. Y.; Fang, Yean-Kuen; Liao, J. C.; Wang, T. J.; Hou, Y. T.; Hsu, P. F.; Lin, K. C.; Huang, K. T.; Lee, T. L.; Liang, M. S. |
| 國立成功大學 |
2009-08 |
New Observations in LOD Effect of 45-nm P-MOSFETs With Strained SiGe Source/Drain and Dummy Gate
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Cheng, Chung-Yun; Fang, Yean-Kuen; Hsieh, Jang-Cheng; Yang, Sheng-Jier; Sheu, Yi-Ming; Hsia, Harry |
| 國立高雄大學 |
2009-07 |
Effect of Nitrogen Incorporation in a Gd Cap Layer on the Reliability of Deep-Submicrometer Hf-Based High-k/Metal-Gate nMOSFETs
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Hsu, Chia-Wei; Fang, Yean-Kuen; Yeh, Wen-Kuan; Chen, Chun-Yu; Lin, Chien-Ting; Hsu, Che-Hua; Cheng, Li-Wei; Lai, Chien-Ming |
| 國立成功大學 |
2009-07 |
Effect of Nitrogen Incorporation in a Gd Cap Layer on the Reliability of Deep-Submicrometer Hf-Based High-k/Metal-Gate nMOSFETs
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Hsu, Chia-Wei; Fang, Yean-Kuen; Yeh, Wen-Kuan; Chen, Chun-Yu; Lin, Chien-Ting; Hsu, Che-Hua; Cheng, Li-Wei; Lai, Chien-Ming |
| 國立成功大學 |
2009-07 |
N-SiCN/P-Silicon Heterojunction With Porous Silicon Buffer Layer for Low-Cost and High-Temperature Ultraviolet (UV) Detecting Applications
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Chiang, Yen-Ting; Fang, Yean-Kuen; Chou, Tse-Heng; Lin, Cheng-I; Juang, Feng-Renn; Kuo, Ta-Wei; Wu, Kuen-Hsien; Ho, Mingtsu; Shie, Jin-Shu |
| 國立成功大學 |
2009-05-07 |
Origins of flash lamp annealing induced p-n junction leakages in a 45 nm p-MOSFET with strained SiGe source/drain
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Cheng, C. Y.; Fang, Yean-Kuen; Hsieh, J. C.; Hsia, H.; Lin, S. S.; Hou, C. S.; Ku, K. C.; Sheu, Y. M. |
| 國立成功大學 |
2009-04 |
Hot-Carrier and Fowler-Nordheim (FN) Tunneling Stresses on RF Reliability of 40-nm PMOSFETs With and Without SiGe Source/Drain
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Tang, Mao-Chyuan; Fang, Yean-Kuen; Chen, David C.; Yeh, Chune-Sin |
| 國立成功大學 |
2009-04 |
Narrow Width and Length Dependence of SiGe and Sallow-Trench-Isolation Stress Induced Defects in 45 nm p-Type Metal-Oxide-Semiconductor Field-Effect Transistors with Strained SiGe Source/Drain
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Cheng, Chung-Yun; Fang, Yean-Kuen; Hsieh, Jang-Cheng; Sheu, Yi-Ming; Hsia, Harry; Chen, Wei-Ming; Lin, Shyue-Shyh; Hou, Chin-Shan |
| 國立成功大學 |
2008-11-21 |
Effect of hot carrier stress on RF reliability of 40 nm PMOSFETs with and without SiGe source/drain
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Tang, Mao-Chyuan; Fang, Yean-Kuen; Wei, Sun-Chin; Chen, David C.; Yeh, Chune-Sin; Huang-Lu, Shiang |
| 國立成功大學 |
2008-11-10 |
The influence of nitrogen incorporation on performance and bias temperature instability of metal oxide semiconductor field effect transistors with ultrathin high-k gate stacks
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Liao, Jia-Ching; Fang, Yean-Kuen; Chen, C. H.; Hou, Y. T.; Hsu, P. F.; Lin, K. C.; Huang, K. T.; Lee, T. L.; Liang, M. S. |
| 國立成功大學 |
2008-11 |
Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer
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Hsu, Chia-Wei; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, Chien-Ting |
| 國立成功大學 |
2008-11 |
Effect of the pre-gate oxide cleaning temperature on the reliability of GOI and devices performances in deep submicron CMOS technology
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Chiang, Yen-Ting; Fang, Yean-Kuen; Huang, Y. J.; Chou, T. H.; Yeh, S. Y.; Lin, C. S. |
| 國立成功大學 |
2008-11 |
The Pd/TiO2/n-LTPS Thin-Film Schottky Diode on Glass Substrate for Hydrogen Sensing Applications
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Chou, Tse-Heng; Fang, Yean-Kuen; Chiang, Yen-Ting; Lin, Kung-Cheng; Lin, Cheng-I; Kao, Chyuan-Haur; Lin, Hsiao-Yi |
| 國立成功大學 |
2008-10-07 |
Effect of STI stress on leakage and V-ccmin of a sub-65nm node low-power SRAM
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Lee, Tung-Hsing; Fang, Yean-Kuen; Chiang, Yen-Ting; Chiu, Hua-Yueh; Chen, Ming-Shing; Cheng, Osbert |
| 國立高雄大學 |
2008-10 |
Significant improvement of 45 nm and beyond complementary metal oxide semiconductor field effect transistor performance with fully silicided and ultimate spacer process technology
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Hsu, Chia-Wei; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan; Hsu, Che-Hua; Lai, Chieh-Ming; Cheng, Li-Wei; Ma, Mike |
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