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"huang m l"的相关文件
显示项目 21-30 / 93 (共10页)
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| 臺大學術典藏 |
2019-12-27T07:49:47Z |
Molecular beam epitaxy grown template for subsequent atomic layer deposition of high 庥 dielectrics
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Lee, K.Y.; Lee, W.C.; Lee, Y.J.; Huang, M.L.; Chang, C.H.; Wu, T.B.; Hong, M.; Kwo, J.; MINGHWEI HONG |
| 臺大學術典藏 |
2019-12-27T07:49:47Z |
III-V MOSFET's with advanced high 庥 dielectrics
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Hong, M.; Kwo, J.; Chen, C.P.; Chang, Y.C.; Huang, M.L.; Lin, T.D.; MINGHWEI HONG |
| 臺大學術典藏 |
2019-12-27T07:49:46Z |
Structural and magnetic properties of epitaxial Fe3Si/GaAs heterostructures
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MINGHWEI HONG; Kwo, J.; Hsu, Y.L.; Lee, Y.J.; Chang, Y.H.; Huang, M.L.; Chiu, Y.N.; Ho, C.C.; Chang, P.; Hsu, C.H.; Hong, M. |
| 臺大學術典藏 |
2019-12-27T07:49:45Z |
Cubic HfO2 doped with y2O2 epitaxial films on GaAs (001) of enhanced dielectric constant
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Yang, Z.K.; Lee, W.C.; Lee, Y.J.; Chang, P.; Huang, M.L.; Hong, M.; Hsu, C.-H.; Kwo, J.; MINGHWEI HONG |
| 臺大學術典藏 |
2019-12-27T07:49:45Z |
A novel approach of using a MBE template for ALD growth of high-庥 dielectrics
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Lee, K.Y.; Lee, W.C.; Huang, M.L.; Chang, C.H.; Lee, Y.J.; Chiu, Y.K.; Wu, T.B.; Hong, M.; Kwo, R.; MINGHWEI HONG |
| 臺大學術典藏 |
2019-12-27T07:49:44Z |
Observation of room temperature ferromagnetic behavior in cluster-free, Co doped Hf O2 films
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Chang, Y.H.; Soo, Y.L.; Lee, W.C.; Huang, M.L.; Lee, Y.J.; Weng, S.C.; Sun, W.H.; Hong, M.; Kwo, J.; Lee, S.F.; Ablett, J.M.; Kao, C.-C.; MINGHWEI HONG |
| 臺大學術典藏 |
2019-12-27T07:49:44Z |
Structural and electrical characteristics of atomic layer deposited high 庥 HfO2on GaN
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Chang, Y.C.; Chiu, H.C.; Lee, Y.J.; Huang, M.L.; Lee, K.Y.; Hong, M.; Chiu, Y.N.; Kwo, J.; Wang, Y.H.; MINGHWEI HONG |
| 臺大學術典藏 |
2019-12-27T07:49:44Z |
Defining new frontiers in electronic devices with high 庥 dielectrics and interfacial engineering
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Hong, M.; Lee, W.C.; Huang, M.L.; Chang, Y.C.; Lin, T.D.; Lee, Y.J.; Kwo, J.; Hsu, C.H.; Lee, H.Y.; MINGHWEI HONG |
| 臺大學術典藏 |
2019-12-27T07:49:44Z |
III-V metal-oxide-semiconductor field-effect transistors with high 庥 dielectrics
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Hong, M.; Kwo, J.R.; Tsai, P.-C.; Chang, Y.; Huang, M.-L.; Chen, C.-P.; Lin, T.-D.; MINGHWEI HONG |
| 臺大學術典藏 |
2019-12-27T07:49:43Z |
InGaAs n-MOS devices integrated using ALD-HfO2/metal gate without surface cleaning and interfacial layer passivation
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MINGHWEI HONG;Lay, T.S.;Cheng, K.Y.;Liao, C.C.;Kwo, J.;Hong, M.;Lin, T.D.;Lee, K.Y.;Lee, Y.J.;Huang, M.L.;Chang, Y.C.; Chang, Y.C.; Huang, M.L.; Lee, Y.J.; Lee, K.Y.; Lin, T.D.; Hong, M.; Kwo, J.; Liao, C.C.; Cheng, K.Y.; Lay, T.S.; MINGHWEI HONG |
显示项目 21-30 / 93 (共10页)
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