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Showing items 26-75 of 206 (5 Page(s) Totally)
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Institution	Date	Title	Author
亞洲大學	201501	CCL5/CCR5 axis induces vascular endothelial growth factor-mediated tumor angiogenesis in human osteosarcoma microenvironment	Wang, SW;Wang, SW;Liu, SC;Liu, SC;Sun, HL;Sun, HL;Huang, TY;Huang, TY;Chan, CH;Chan, CH;Yang, CY;Yang, CY;Yeh, HI;Yeh, HI;黃元勵;HUANG, YUAN-LI;Chou WY, ;Lin YM, ;Tang, CH;Tang, CH
亞洲大學	2015-01	CCL5/CCR5 axis induces vascular endothelial growth factor-mediated tumor angiogenesis in human osteosarcoma microenvironment	Wang, SW;Wang, SW;Liu, SC;Liu, SC;Sun, HL;Sun, HL;Huang, TY;Huang, TY;Chan, CH;Chan, CH;Yang, CY;Yang, CY;Yeh, HI;Yeh, HI;黃元勵;HUANG, YUAN-LI;Chou WY, ;Lin YM, ;Tang, CH;Tang, CH
國立交通大學	2014-12-08T15:49:20Z	Effects of N2O-annealed sacrificial oxide on the short-channel effects of nMOSFETs	Jong, FC; Huang, TY; Chao, TS; Lin, HC; Wang, MF; Chang, CY
國立交通大學	2014-12-08T15:49:16Z	Evaluation of plasma charging damage in ultrathin gate oxides	Lin, HC; Chen, CC; Chien, CH; Hsein, SK; Wang, MF; Chao, TS; Huang, TY; Chang, CY
國立交通大學	2014-12-08T15:49:00Z	Rugged surface polycrystalline silicon film formed by rapid thermal chemical vapor deposition for dynamic random access memory stacked capacitor application	Lin, M; Chang, CY; Huang, TY; Kuo, UJ
國立交通大學	2014-12-08T15:48:56Z	Improving radiation hardness of EEPROM/flash cell by N2O annealing	Huang, TY; Jong, FC; Chao, TS; Lin, HC; Leu, LY; Young, K; Lin, CH; Chiu, KY
國立交通大學	2014-12-08T15:48:55Z	Comparison of N-2 and NH3 plasma passivation effects on polycrystalline silicon thin-film transistors	Lee, YS; Lin, HY; Lei, TF; Huang, TY; Chang, TC; Chang, CY
國立交通大學	2014-12-08T15:47:36Z	Improvement of reliability of metal-oxide semiconductor field-effect transistors with N2O nitrided gate oxide and N2O polysilicon gate reoxidation	Lai, CS; Chao, TS; Lei, TF; Lee, CL; Huang, TY; Chang, CY
國立交通大學	2014-12-08T15:47:03Z	The effects of shallow germanium halo doping on N-channel metal oxide semiconductor field effect transistors	Wang, MF; Chien, CH; Chao, TS; Lin, HC; Jong, FC; Huang, TY; Chang, CY
國立交通大學	2014-12-08T15:46:47Z	Oxide thickness dependence of plasma charging damage	Lin, HC; Chen, CC; Wang, MF; Hsien, SK; Chien, CH; Huang, TY; Chang, CY
國立交通大學	2014-12-08T15:46:43Z	Leakage current reduction of chemical-vapor-deposited Ta2O5 films on rugged polycrystalline silicon electrode for dynamic random access memory application	Lin, M; Chang, CY; Huang, TY; Shieh, WY
國立交通大學	2014-12-08T15:46:37Z	Reliability of ultrathin gate oxides for ULSI devices	Chang, CY; Chen, CC; Lin, HC; Liang, MS; Chien, CH; Huang, TY
國立交通大學	2014-12-08T15:46:29Z	Temperature-accelerated dielectric breakdown in ultrathin gate oxides	Chen, CC; Chang, CY; Chien, CH; Huang, TY; Lin, HC; Liang, MS
國立交通大學	2014-12-08T15:46:25Z	Highly (111) textured titanium nitride layers for sub- quarter-micrometer Al metallization	Wu, WF; Lin, CC; Huang, CC; Lin, HC; Chang, TC; Yang, RP; Huang, TY
國立交通大學	2014-12-08T15:46:20Z	A novel lightly doped drain polysilicon thin-film transistor with oxide sidewall spacer formed by one-step selective liquid phase deposition	Shih, PS; Chang, CY; Chang, TC; Huang, TY; Peng, DZ; Yeh, CF
國立交通大學	2014-12-08T15:46:15Z	Characterization and modeling of out-diffusion of manganese and zinc impurities from deep ultraviolet photoresist	Wang, MY; Ko, FH; Wang, TK; Yang, CC; Huang, TY
國立交通大學	2014-12-08T15:46:05Z	A multilevel interconnect technology with intrametal air gap for high-performance 0.25-mu m-and-beyond devices manufacturing	Lin, M; Chang, CY; Huang, TY; Lin, ML
國立交通大學	2014-12-08T15:46:00Z	The combined effects of nitrogen implantation at S/D extension and N2O oxide on 0.18 mu m N- and P-metal oxide field effect transistors (MOSFETs)	Chao, TS; Chang, SJ; Chien, CH; Lin, HC; Huang, TY; Chang, CY
國立交通大學	2014-12-08T15:45:52Z	Improved immunity to plasma damage in ultrathin nitrided oxides	Chen, CC; Lin, HC; Chang, CY; Liang, MS; Chien, CH; Hsien, SK; Huang, TY
國立交通大學	2014-12-08T15:45:46Z	Effects of polysilicon gate doping concentration on plasma charging damage in ultrathin gate oxides	Chen, CC; Lin, HC; Chang, CY; Huang, TY; Chien, CH; Liang, MS
國立交通大學	2014-12-08T15:45:46Z	The effects of microcrystalline silicon film structure on low-high-low band-gap thin film transistor	Chang, CY; Lee, YS; Huang, TY; Shih, PS; Lin, CW
國立交通大學	2014-12-08T15:45:36Z	High performance 0.1 mu m dynamic threshold MOSFET using indium channel implantation	Chang, SJ; Chang, CY; Chao, TS; Huang, TY
國立交通大學	2014-12-08T15:45:26Z	Characterization of NH3 plasma-treated Ba0.7Sr0.3TiO3 thin films	Wuu, DS; Horng, RH; Liao, FC; Leu, CC; Huang, TY; Sze, SM; Chen, HY; Chang, CY
國立交通大學	2014-12-08T15:45:26Z	Effects of O-2 plasma treatment on the electric and dielectric characteristics of Ba0.7Sr0.3TiO3 thin films	Leu, CC; Chan, SH; Chen, HY; Horng, RH; Wuu, DS; Wu, LH; Huang, TY; Chang, CY; Sze, SM
國立交通大學	2014-12-08T15:45:19Z	Improvements of amorphous-silicon inverted-staggered thin-film transistors using high-temperature-deposited Al gate with chemical mechanical polishing	Shih, PS; Chang, TC; Liang, CY; Huang, TY; Chang, CY
國立交通大學	2014-12-08T15:45:15Z	Improved ultrathin gate oxide integrity in p(+)-polysilicon-gate p-channel metal oxide semiconductor with medium-dose fluorine implantation	Chen, CC; Lin, HC; Chang, CY; Huang, TY; Chien, CH; Liang, MS
國立交通大學	2014-12-08T15:45:10Z	Dimensional effects on the drain current of n- and p-channel polycrystalline silicon thin film transistors	Shih, PS; Zan, HW; Chang, TC; Huang, TY; Chang, CY
國立交通大學	2014-12-08T15:45:07Z	Study of boron effects on the reaction of Co and Si1-xGex at various temperatures	Huang, HJ; Chen, KM; Chang, CY; Huang, TY; Chang, TC; Chen, LP; Huang, GW
國立交通大學	2014-12-08T15:45:05Z	Plasma-induced charging damage in ultrathin (3-nm) gate oxides	Chen, CC; Lin, HC; Chang, CY; Liang, MS; Chien, CH; Hsien, SK; Huang, TY; Chao, TS
國立交通大學	2014-12-08T15:44:57Z	Plasma-process-induced damage in sputtered TiN metal-gate capacitors with ultrathin nitrided oxides	Chen, CC; Lin, HC; Chang, CY; Chao, TS; Huang, TY; Liang, MS
國立交通大學	2014-12-08T15:44:56Z	Study on Ge/Si ratio, silicidation, and strain relaxation of high temperature sputtered Co/Si1-xGex structures	Huang, HJ; Chen, KM; Chang, CY; Huang, TY; Chen, LP; Huang, GW
國立交通大學	2014-12-08T15:44:54Z	Reduction of source/drain series resistance and its impact on device performance for PMOS transistors with raised Si1-xGex source/drain	Huang, HJ; Chen, KM; Chang, CY; Chen, LP; Huang, GW; Huang, TY
國立交通大學	2014-12-08T15:44:54Z	An anomalous crossover in Vth roll-off for indium-doped nMOSFETs	Chang, SJ; Chang, CY; Chen, CM; Chou, JW; Chao, TS; Huang, TY
國立交通大學	2014-12-08T15:44:51Z	Reduced reverse narrow channel effect in thin SOI nMOSFETs	Chang, CY; Chang, SJ; Chao, TS; Wu, SD; Huang, TY
國立交通大學	2014-12-08T15:44:47Z	Characterization and reliability of lightly-doped-drain polysilicon thin-film transistors with oxide sidewall spacer formed by one-step selective liquid phase deposition	Shih, PS; Chang, TC; Huang, TY; Yeh, CF; Chang, CY
國立交通大學	2014-12-08T15:44:45Z	The effects of growth temperature on the microstructure and electrical barrier height in PtSi/p-Si(100) Schottky barrier detector	Horng, GJ; Chang, CY; Ho, C; Lee, CY; Huang, TY
國立交通大學	2014-12-08T15:44:34Z	Improved electrical properties of shallow p(+)-n junction using selectively grown graded Si1-xGex epitaxial structure	Huang, HJ; Chen, KM; Chang, CY; Huang, TY; Chen, LP; Huang, GW
國立交通大學	2014-12-08T15:44:33Z	High-performance and high-reliability 80-nm gate-length DTMOS with indium super steep retrograde channel	Chang, SJ; Chang, CY; Chen, CM; Chao, TS; Lee, YJ; Huang, TY
國立交通大學	2014-12-08T15:44:25Z	The effects of super-steep-retrograde indium channel profile on deep submicron n-channel metal-oxide-semiconductor field-effect transistor	Chen, CM; Chang, SJ; Chou, JW; Lin, T; Yeh, WK; Chang, CY; Luo, WZ; Lee, YJ; Chao, TS; Huang, TY
國立交通大學	2014-12-08T15:44:20Z	A novel thin-film transistor with self-aligned field induced drain	Lin, HC; Yu, CM; Lin, CY; Yeh, KL; Huang, TY; Lei, TF
國立交通大學	2014-12-08T15:44:10Z	Electrical and compositional properties of co-silicided shallow p(+)-n junction using Si-capped/boron-doped Si1-xGex layer deposited by UHVCME	Huang, HJ; Chen, KM; Chang, CY; Huang, TY
國立交通大學	2014-12-08T15:44:07Z	The reaction of Co and Si1-xGex for MOSFET with poly-Si1-xGex gate	Chen, KM; Huang, HJ; Chang, CY; Huang, TY; Huang, GW; Chen, LP
國立交通大學	2014-12-08T15:43:58Z	Schottky barrier thin-film transistor (SBTFT) with silicided source/drain and field-induced drain extension	Lin, HC; Yeh, KL; Huang, RG; Lin, CY; Huang, TY
國立交通大學	2014-12-08T15:43:51Z	Electrical properties of shallow p(+)-n junction using boron-doped Si1-xGex layer deposited by ultrahigh vacuum chemical molecular epitaxy	Huang, HJ; Chen, KM; Chang, CY; Chao, TS; Huang, TY
國立交通大學	2014-12-08T15:43:41Z	Post-soft-breakdown characteristics of deep submicron NMOSFETs with ultrathin gate oxide	Tsai, MY; Lin, HC; Lee, DY; Huang, TY
國立交通大學	2014-12-08T15:43:40Z	X-ray photoelectron spectroscopy of gate-quality silicon oxynitride films produced by annealing plasma-nitrided Si(100) in nitrous oxide	Chen, HW; Landheer, D; Chao, TS; Hulse, JE; Huang, TY
國立交通大學	2014-12-08T15:43:37Z	Conduction mechanisms for off-state leakage current of Schottky barrier thin-film transistors	Yeh, KL; Lin, HC; Huang, RG; Tsai, RW; Huang, TY
國立交通大學	2014-12-08T15:43:36Z	Improved low temperature characteristics of p-channel MOSFETs with Si1-xGex raised source and drain	Huang, HJ; Chen, KM; Huang, TY; Chao, TS; Huang, GW; Chien, CH; Chang, CY
國立交通大學	2014-12-08T15:43:27Z	Electrical characteristics of thin cerium oxide film on silicon substrate by reactive DC sputtering	Pan, TM; Chien, CH; Lei, TF; Chao, TS; Huang, TY
國立交通大學	2014-12-08T15:43:22Z	Improving the RF performance of 0.18 mu m CMOS with deep n-well implantation	Su, JG; Hsu, HM; Wong, SC; Chang, CY; Huang, TY; Sun, JYC

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