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机构 日期 题名 作者
國立交通大學 2014-12-08T15:36:00Z Low-temperature growth of polycrystalline ge films on SiO2 substrate by HDPCVD Yang, MJ; Shieh, J; Hsu, SL; Huang, IJ; Leu, CC; Shen, SW; Huang, TY; Lehnen, P; Chien, CH
國立交通大學 2014-12-08T15:27:25Z A model for photoresist-induced charging damage in ultra-thin gate oxides Lin, HC; Chien, CH; Wang, MF; Huang, TY; Chang, CY
國立交通大學 2014-12-08T15:27:09Z Breakdown characteristics of ultra-thin gate oxides caused by plasma charging Chen, CC; Lin, HC; Chang, CY; Chien, CH; Huang, TY
國立交通大學 2014-12-08T15:27:08Z Characterization and lithographic parameters extraction for the modified resists Ko, FH; Lu, JK; Chu, TC; Huang, TY; Yang, CC; Sheu, JT; Huang, HL
國立交通大學 2014-12-08T15:27:07Z New insights on RF CMOS stability related to bias, scaling, and temperature Su, JG; Wong, SC; Chang, CY; Chiu, KY; Huang, TY; Ou, CT; Kao, CH; Chao, CJ
國立交通大學 2014-12-08T15:27:02Z Plasma process induced damage in sputtered TiN metal gate capacitors with ultra-thin nitrided oxide Chen, CC; Lin, HC; Chang, CY; Chao, TS; Huang, SC; Wu, WF; Huang, TY; Liang, MS
國立交通大學 2014-12-08T15:27:02Z Improved plasma charging immunity in ultra-thin gate oxide with fluorine and nitrogen implantation Chen, CC; Lin, HC; Chang, CY; Huang, CC; Chien, CH; Huang, TY; Liang, MS
國立交通大學 2014-12-08T15:26:58Z Characterization and modeling of out-diffusion of cesium, manganese and zinc impurities from deep ultraviolet photoresist Ko, FH; Wang, MY; Wang, TK; Yang, CC; Huang, TY; Wu, CS
國立交通大學 2014-12-08T15:26:56Z Film characterization and evaluation of process performance for the modified electron beam resist Ko, FH; Ting, JH; Chou, CT; Hsiao, LT; Huang, TY; Dai, BT
國立交通大學 2014-12-08T15:26:54Z Thermal stability of PVD TiN gate and its impacts on characteristics of CMOS transistors Wang, MF; Kao, YC; Huang, TY; Lin, HC; Chang, CY

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