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Showing items 26-35 of 313  (32 Page(s) Totally)
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Institution Date Title Author
臺大學術典藏 2019-10-31T07:58:05Z Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates KUEN-YU TSAI;Kuen-Yu Tsai*;Chien-Lin Lee;Xin-Yang Zheng;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Xin-Yang Zheng; Chien-Lin Lee; Kuen-Yu Tsai*; KUEN-YU TSAI
臺大學術典藏 2019-10-31T07:58:05Z Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates KUEN-YU TSAI;Kuen-Yu Tsai*;Chien-Lin Lee;Xin-Yang Zheng;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Xin-Yang Zheng; Chien-Lin Lee; Kuen-Yu Tsai*; KUEN-YU TSAI
臺大學術典藏 2019-10-31T07:58:04Z Simulation-based proximity effect correction for helium ion beam lithography KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI
臺大學術典藏 2019-10-31T07:58:04Z Simulation-based proximity effect correction for helium ion beam lithography KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI
臺大學術典藏 2019-10-31T07:58:04Z Simulation-based proximity effect correction for helium ion beam lithography KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI
臺大學術典藏 2019-10-31T07:58:04Z Simulation-based proximity effect correction for helium ion beam lithography KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI
臺大學術典藏 2019-10-31T07:58:03Z Model-based proximity effect correction for helium ion beam lithography KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI
臺大學術典藏 2019-10-31T07:58:03Z Model-based proximity effect correction for helium ion beam lithography KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI
臺大學術典藏 2019-10-31T07:58:03Z Model-based proximity effect correction for helium ion beam lithography KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI
臺大學術典藏 2019-10-31T07:58:03Z Model-based proximity effect correction for helium ion beam lithography KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI

Showing items 26-35 of 313  (32 Page(s) Totally)
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