臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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機構	日期	題名	作者
臺大學術典藏	2019-10-31T07:58:05Z	Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates	KUEN-YU TSAI;Kuen-Yu Tsai;Chien-Lin Lee;Xin-Yang Zheng;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Xin-Yang Zheng; Chien-Lin Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:05Z	Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates	KUEN-YU TSAI;Kuen-Yu Tsai;Chien-Lin Lee;Xin-Yang Zheng;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Xin-Yang Zheng; Chien-Lin Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:04Z	Simulation-based proximity effect correction for helium ion beam lithography	KUEN-YU TSAI;Kuen-Yu Tsai;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:04Z	Simulation-based proximity effect correction for helium ion beam lithography	KUEN-YU TSAI;Kuen-Yu Tsai;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:04Z	Simulation-based proximity effect correction for helium ion beam lithography	KUEN-YU TSAI;Kuen-Yu Tsai;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:04Z	Simulation-based proximity effect correction for helium ion beam lithography	KUEN-YU TSAI;Kuen-Yu Tsai;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:03Z	Model-based proximity effect correction for helium ion beam lithography	KUEN-YU TSAI;Kuen-Yu Tsai;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:03Z	Model-based proximity effect correction for helium ion beam lithography	KUEN-YU TSAI;Kuen-Yu Tsai;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:03Z	Model-based proximity effect correction for helium ion beam lithography	KUEN-YU TSAI;Kuen-Yu Tsai;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:03Z	Model-based proximity effect correction for helium ion beam lithography	KUEN-YU TSAI;Kuen-Yu Tsai;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:01Z	Fabrication of metrology test structures with helium ion beam direct write	KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:01Z	Fabrication of metrology test structures with helium ion beam direct write	KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:01Z	Fabrication of metrology test structures with helium ion beam direct write	KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:01Z	Fabrication of metrology test structures with helium ion beam direct write	KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:00Z	Fabrication of metrology test structures with helium ion beam direct write	KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:00Z	Fabrication of metrology test structures with helium ion beam direct write	KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:00Z	Fabrication of metrology test structures with helium ion beam direct write	KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:00Z	Fabrication of metrology test structures with helium ion beam direct write	KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:57:58Z	Fabrication of metrology test structures with programmed imperfection using helium ion beam direct write	KUEN-YU TSAI;Jia-Han Li;Kuen-Yu Tsai;Sheng-Wei Chien; Sheng-Wei Chien; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:57:58Z	Fabrication of metrology test structures with programmed imperfection using helium ion beam direct write	KUEN-YU TSAI;Jia-Han Li;Kuen-Yu Tsai;Sheng-Wei Chien; Sheng-Wei Chien; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:57:58Z	Fabrication of metrology test structures with programmed imperfection using helium ion beam direct write	KUEN-YU TSAI;Jia-Han Li;Kuen-Yu Tsai;Sheng-Wei Chien; Sheng-Wei Chien; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:57:58Z	Fabrication of metrology test structures with programmed imperfection using helium ion beam direct write	KUEN-YU TSAI;Jia-Han Li;Kuen-Yu Tsai;Sheng-Wei Chien; Sheng-Wei Chien; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:36:26Z	Method and System for Establishing Parametric Model	Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:36:26Z	Method and System for Establishing Parametric Model	Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:26:03Z	Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam–direct-write lithography	Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Hsuan-Ping Lee;Sheng-Yung Chen;Chun-Hung Liu;Ding-Qi;Yu-Tian Shen;Kuen-Yu Tsai; Hsuan-Ping Lee; Sheng-Yung Chen; Chun-Hung Liu; Ding-Qi

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