| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Proximity Effects of Particle Beam Lithography Processes
|
Kuen-Yu Tsai;Chun-Hung Liu;Chooi-Wan Ng;Pei-Lin Tien; Kuen-Yu Tsai; Chun-Hung Liu; Chooi-Wan Ng; Pei-Lin Tien; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Proximity Effects of Particle Beam Lithography Processes
|
Kuen-Yu Tsai;Chun-Hung Liu;Chooi-Wan Ng;Pei-Lin Tien; Kuen-Yu Tsai; Chun-Hung Liu; Chooi-Wan Ng; Pei-Lin Tien; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Effect of Patterning Process and Apparatus Thereof
|
Yi-Sheng Su; KUEN-YU TSAI; Kuen-Yu Tsai; Chooi-Wan Ng; Kuen-Yu Tsai;Chooi-Wan Ng;Yi-Sheng Su |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Effect of Patterning Process and Apparatus Thereof
|
Yi-Sheng Su; KUEN-YU TSAI; Kuen-Yu Tsai; Chooi-Wan Ng; Kuen-Yu Tsai;Chooi-Wan Ng;Yi-Sheng Su |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Effect of Patterning Process and Apparatus Thereof
|
Yi-Sheng Su; KUEN-YU TSAI; Kuen-Yu Tsai; Chooi-Wan Ng; Kuen-Yu Tsai;Chooi-Wan Ng;Yi-Sheng Su |
| 臺大學術典藏 |
2018-09-10T09:50:33Z |
Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip C. W. Ng;Yu-Tian Shen;Sheng-Wei Chien;Kuen-Yu Tsai; Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:50:33Z |
Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip C. W. Ng;Yu-Tian Shen;Sheng-Wei Chien;Kuen-Yu Tsai; Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:50:33Z |
Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip C. W. Ng;Yu-Tian Shen;Sheng-Wei Chien;Kuen-Yu Tsai; Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:43:35Z |
Solution-refined method for electrostatic potential distribution of large-scale electron optics
|
Lee, Y.-M.;Li, J.-H.;Sheu, T.-W.-H.;Tsai, K.-Y.;Yen, J.-Y.; Lee, Y.-M.; Li, J.-H.; Sheu, T.-W.-H.; Tsai, K.-Y.; Yen, J.-Y.; KUEN-YU TSAI; JIA-YUSH YEN |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints
|
Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints
|
Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints
|
Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Direct-scatterometry-enabled lithography model calibration
|
Chih-Yu Chen;Kuen-Yu Tsai;Yu-Tian Shen;Yen-Min Lee;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Kuen-Yu Tsai; Yu-Tian Shen; Yen-Min Lee; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Direct-scatterometry-enabled lithography model calibration
|
Chih-Yu Chen;Kuen-Yu Tsai;Yu-Tian Shen;Yen-Min Lee;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Kuen-Yu Tsai; Yu-Tian Shen; Yen-Min Lee; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Direct-scatterometry-enabled lithography model calibration
|
Chih-Yu Chen;Kuen-Yu Tsai;Yu-Tian Shen;Yen-Min Lee;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Kuen-Yu Tsai; Yu-Tian Shen; Yen-Min Lee; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Architecture and EOS Design Flow of a Multiple-Electron-Beam–Direct-Write System Considering Patterning Fidelity, Breakdown Effect
|
Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Architecture and EOS Design Flow of a Multiple-Electron-Beam–Direct-Write System Considering Patterning Fidelity, Breakdown Effect
|
Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Architecture and EOS Design Flow of a Multiple-Electron-Beam–Direct-Write System Considering Patterning Fidelity, Breakdown Effect
|
Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Study of etching bias modeling and correction strategies for patterning processes
|
Philip C.W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C.W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Study of etching bias modeling and correction strategies for patterning processes
|
Philip C.W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C.W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Study of etching bias modeling and correction strategies for patterning processes
|
Philip C.W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C.W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Solution-refined method for solving large-scale computation problems: Taking the Laplace's equation as an example
|
Yen-Min Lee;Jia-Han Li;Tony Wen-Hann Sheu;Kuen-Yu Tsai;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Tony Wen-Hann Sheu; Kuen-Yu Tsai; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Solution-refined method for solving large-scale computation problems: Taking the Laplace's equation as an example
|
Yen-Min Lee;Jia-Han Li;Tony Wen-Hann Sheu;Kuen-Yu Tsai;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Tony Wen-Hann Sheu; Kuen-Yu Tsai; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Solution-refined method for solving large-scale computation problems: Taking the Laplace's equation as an example
|
Yen-Min Lee;Jia-Han Li;Tony Wen-Hann Sheu;Kuen-Yu Tsai;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Tony Wen-Hann Sheu; Kuen-Yu Tsai; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
The effect of NBTI on 3D integrated circuits
|
Cheng-Hong Lin;Yi-Chang Lu;Chin-Khai Tang;Kuen-Yu Tsai; Cheng-Hong Lin; Yi-Chang Lu; Chin-Khai Tang; Kuen-Yu Tsai; YI-CHANG LU; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
The effect of NBTI on 3D integrated circuits
|
Cheng-Hong Lin;Yi-Chang Lu;Chin-Khai Tang;Kuen-Yu Tsai; Cheng-Hong Lin; Yi-Chang Lu; Chin-Khai Tang; Kuen-Yu Tsai; YI-CHANG LU; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
The effect of NBTI on 3D integrated circuits
|
Cheng-Hong Lin;Yi-Chang Lu;Chin-Khai Tang;Kuen-Yu Tsai; Cheng-Hong Lin; Yi-Chang Lu; Chin-Khai Tang; Kuen-Yu Tsai; YI-CHANG LU; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:24:59Z |
New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:24:59Z |
New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:24:59Z |
New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:35Z |
Method For Non-Resist Nanolithography
|
Miin-Jang Chen;Kuen-Yu Tsai;Chee-Wee Liu; Miin-Jang Chen; Kuen-Yu Tsai; Chee-Wee Liu; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:35Z |
Method For Non-Resist Nanolithography
|
Miin-Jang Chen;Kuen-Yu Tsai;Chee-Wee Liu; Miin-Jang Chen; Kuen-Yu Tsai; Chee-Wee Liu; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:35Z |
Method For Non-Resist Nanolithography
|
Miin-Jang Chen;Kuen-Yu Tsai;Chee-Wee Liu; Miin-Jang Chen; Kuen-Yu Tsai; Chee-Wee Liu; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:35Z |
Charged-Particle-Beam Patterning Without Resist
|
Kuen-Yu Tsai;Miin-Jang Chen;Samuel C. Pan; Kuen-Yu Tsai; Miin-Jang Chen; Samuel C. Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:35Z |
Charged-Particle-Beam Patterning Without Resist
|
Kuen-Yu Tsai;Miin-Jang Chen;Samuel C. Pan; Kuen-Yu Tsai; Miin-Jang Chen; Samuel C. Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:35Z |
Charged-Particle-Beam Patterning Without Resist
|
Kuen-Yu Tsai;Miin-Jang Chen;Samuel C. Pan; Kuen-Yu Tsai; Miin-Jang Chen; Samuel C. Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:35Z |
Multilayer Mirror Structure
|
Jia-Han Li;Yen-Min Lee;Kuen-Yu Tsai; Jia-Han Li; Yen-Min Lee; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:35Z |
Multilayer Mirror Structure
|
Jia-Han Li;Yen-Min Lee;Kuen-Yu Tsai; Jia-Han Li; Yen-Min Lee; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:35Z |
Multilayer Mirror Structure
|
Jia-Han Li;Yen-Min Lee;Kuen-Yu Tsai; Jia-Han Li; Yen-Min Lee; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Method for Adjusting Status of Particle Beams for Patterning A Substrate And System Using The Same
|
Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Method for Adjusting Status of Particle Beams for Patterning A Substrate And System Using The Same
|
Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Method for Adjusting Status of Particle Beams for Patterning A Substrate And System Using The Same
|
Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Apparatus and Method for Estimating Change of Status of Particle Beams
|
Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Apparatus and Method for Estimating Change of Status of Particle Beams
|
Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Apparatus and Method for Estimating Change of Status of Particle Beams
|
Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Method and Computer-Aided Design System Of Manufacturing An Optical System
|
Kuen-Yu Tsai;Sheng-Yung Chen;Shih-Chuan Chen; Kuen-Yu Tsai; Sheng-Yung Chen; Shih-Chuan Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Method and Computer-Aided Design System Of Manufacturing An Optical System
|
Kuen-Yu Tsai;Sheng-Yung Chen;Shih-Chuan Chen; Kuen-Yu Tsai; Sheng-Yung Chen; Shih-Chuan Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Method and Computer-Aided Design System Of Manufacturing An Optical System
|
Kuen-Yu Tsai;Sheng-Yung Chen;Shih-Chuan Chen; Kuen-Yu Tsai; Sheng-Yung Chen; Shih-Chuan Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Method and System for Establishing Parametric Model (參數化模型的建立方法及系統)
|
Kuen-Yu Tsai;Chun-Hung Liu; Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Method and System for Establishing Parametric Model (參數化模型的建立方法及系統)
|
Kuen-Yu Tsai;Chun-Hung Liu; Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI |
