| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Projection Patterning With Exposure Mask
|
Kuen-Yu Tsai;Miin-Jang Chen;Si-Chen Lee; Kuen-Yu Tsai; Miin-Jang Chen; Si-Chen Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Projection Patterning With Exposure Mask
|
Kuen-Yu Tsai;Miin-Jang Chen;Si-Chen Lee; Kuen-Yu Tsai; Miin-Jang Chen; Si-Chen Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects
|
Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects
|
Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Lithography-patterning-fidelity-aware electron-optical system design optimization
|
Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Lithography-patterning-fidelity-aware electron-optical system design optimization
|
Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Lithography-patterning-fidelity-aware electron-optical system design optimization
|
Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Lithography-patterning-fidelity-aware electron-optical system design optimization
|
Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images
|
Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images
|
Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
System and Method for Estimating Change of Status of Particle Beams
|
Kuen-Yu Tsai;Sheng-Yung Chen;Jia-Yush Yen;Yung-Yaw Chen;Chi-Hsiang Fan; Kuen-Yu Tsai; Sheng-Yung Chen; Jia-Yush Yen; Yung-Yaw Chen; Chi-Hsiang Fan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
System and Method for Estimating Change of Status of Particle Beams
|
Kuen-Yu Tsai;Sheng-Yung Chen;Jia-Yush Yen;Yung-Yaw Chen;Chi-Hsiang Fan; Kuen-Yu Tsai; Sheng-Yung Chen; Jia-Yush Yen; Yung-Yaw Chen; Chi-Hsiang Fan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
System and Method for Estimating Change of Status of Particle Beams
|
Kuen-Yu Tsai;Sheng-Yung Chen;Jia-Yush Yen;Yung-Yaw Chen;Chi-Hsiang Fan; Kuen-Yu Tsai; Sheng-Yung Chen; Jia-Yush Yen; Yung-Yaw Chen; Chi-Hsiang Fan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
|
Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
|
Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Fabrication method of high-quality Ge nanocrystals on patterned Si substrates by local melting point control
|
Chien-Wei Chiu; Ting-Wei Liao; Kuen-Yu Tsai; Fu-Min Wang; Yuen-Wuu Suen; Chieh-Hsiung Kuan; KUEN-YU TSAI; CHIEH-HSIUNG KUAN |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Fabrication method of high-quality Ge nanocrystals on patterned Si substrates by local melting point control
|
Chien-Wei Chiu; Ting-Wei Liao; Kuen-Yu Tsai; Fu-Min Wang; Yuen-Wuu Suen; Chieh-Hsiung Kuan; KUEN-YU TSAI; CHIEH-HSIUNG KUAN |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Impact of process-effect correction strategies on variability of critical dimension and electrical characteristics in extreme ultraviolet lithography
|
Ng, Sheng-Wei ; Chien, Bo-Sen ; Chang, Kuen-Yu ; Tsai*, Yi-Chang ; Lu, Jia-Han ; Li,Alek C.; ChenNg, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C.; Ng, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C.; YI-CHANG LU; KUEN-YU TSAI; Li, Jia-Han |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Silicon photodiodes for electron beam position and drift detection in scanning electron microscopy and electron beam lithography system
|
Kuen-Yu Tsai; Yung-Yaw Chen; KUEN-YU TSAI; YUNG-YAW CHEN; JIA-YUSH YEN; Sheng-Yung Chen; Jia-Yush Yen; Cheng-Ju Wu; Yi-Hung Kuo |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Silicon photodiodes for electron beam position and drift detection in scanning electron microscopy and electron beam lithography system
|
Kuen-Yu Tsai; Yung-Yaw Chen; KUEN-YU TSAI; YUNG-YAW CHEN; JIA-YUSH YEN; Sheng-Yung Chen; Jia-Yush Yen; Cheng-Ju Wu; Yi-Hung Kuo |
| 臺大學術典藏 |
2018-09-10T08:18:26Z |
Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography
|
Philip C. W. Ng;Sheng-Wei Chien;Bo-Sen Chang;Kuen-Yu Tsai;Yi-Chang Lu; Philip C. W. Ng; Sheng-Wei Chien; Bo-Sen Chang; Kuen-Yu Tsai; Yi-Chang Lu; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:26Z |
Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography
|
Philip C. W. Ng;Sheng-Wei Chien;Bo-Sen Chang;Kuen-Yu Tsai;Yi-Chang Lu; Philip C. W. Ng; Sheng-Wei Chien; Bo-Sen Chang; Kuen-Yu Tsai; Yi-Chang Lu; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:26Z |
Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography
|
Philip C. W. Ng;Sheng-Wei Chien;Bo-Sen Chang;Kuen-Yu Tsai;Yi-Chang Lu; Philip C. W. Ng; Sheng-Wei Chien; Bo-Sen Chang; Kuen-Yu Tsai; Yi-Chang Lu; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:26Z |
Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write
|
Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:26Z |
Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write
|
Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:26Z |
Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write
|
Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:26Z |
Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system
|
Yen-Min Lee;Jia-Han Li;Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai;Tony W. H. Sheu;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony W. H. Sheu; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:26Z |
Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system
|
Yen-Min Lee;Jia-Han Li;Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai;Tony W. H. Sheu;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony W. H. Sheu; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:26Z |
Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system
|
Yen-Min Lee;Jia-Han Li;Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai;Tony W. H. Sheu;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony W. H. Sheu; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:25Z |
High spatial resolution and large field intensity by a set of two modified zone plates
|
Zhan-Yu Liu;Yao-Jen Tsai;Jia-Han Li;Kuen-Yu Tsai; Zhan-Yu Liu; Yao-Jen Tsai; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:25Z |
High spatial resolution and large field intensity by a set of two modified zone plates
|
Zhan-Yu Liu;Yao-Jen Tsai;Jia-Han Li;Kuen-Yu Tsai; Zhan-Yu Liu; Yao-Jen Tsai; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:25Z |
High spatial resolution and large field intensity by a set of two modified zone plates
|
Zhan-Yu Liu;Yao-Jen Tsai;Jia-Han Li;Kuen-Yu Tsai; Zhan-Yu Liu; Yao-Jen Tsai; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
Beam drift detection using a two-dimensional electron beam position monitor system for multiple-electron-beam–direct-write lithography
|
Sheng-Yung Chen;Kuen-Yu Tsai;Hoi-Tou Ng;Chi-Hsiung Fan;Ting-Han Pei;Chieh-Hsiung Kuan;Yung-Yaw Chen;Yi-Hung Kuo;Cheng-Ju Wu;Jia-Yush Yen; Sheng-Yung Chen; Kuen-Yu Tsai; Hoi-Tou Ng; Chi-Hsiung Fan; Ting-Han Pei; Chieh-Hsiung Kuan; Yung-Yaw Chen; Yi-Hung Kuo; Cheng-Ju Wu; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
Beam drift detection using a two-dimensional electron beam position monitor system for multiple-electron-beam–direct-write lithography
|
Sheng-Yung Chen;Kuen-Yu Tsai;Hoi-Tou Ng;Chi-Hsiung Fan;Ting-Han Pei;Chieh-Hsiung Kuan;Yung-Yaw Chen;Yi-Hung Kuo;Cheng-Ju Wu;Jia-Yush Yen; Sheng-Yung Chen; Kuen-Yu Tsai; Hoi-Tou Ng; Chi-Hsiung Fan; Ting-Han Pei; Chieh-Hsiung Kuan; Yung-Yaw Chen; Yi-Hung Kuo; Cheng-Ju Wu; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
Beam drift detection using a two-dimensional electron beam position monitor system for multiple-electron-beam–direct-write lithography
|
Sheng-Yung Chen;Kuen-Yu Tsai;Hoi-Tou Ng;Chi-Hsiung Fan;Ting-Han Pei;Chieh-Hsiung Kuan;Yung-Yaw Chen;Yi-Hung Kuo;Cheng-Ju Wu;Jia-Yush Yen; Sheng-Yung Chen; Kuen-Yu Tsai; Hoi-Tou Ng; Chi-Hsiung Fan; Ting-Han Pei; Chieh-Hsiung Kuan; Yung-Yaw Chen; Yi-Hung Kuo; Cheng-Ju Wu; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip Ng;Yu-Tian Shen;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip Ng;Yu-Tian Shen;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip Ng;Yu-Tian Shen;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
10 nm lines with 14 nm half pitch grating written in HSQ by electron beam direct write at 5 keV
|
Fu-Min Wang;Susumu Ono;Hsin-Hung Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; Susumu Ono; Hsin-Hung Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
10 nm lines with 14 nm half pitch grating written in HSQ by electron beam direct write at 5 keV
|
Fu-Min Wang;Susumu Ono;Hsin-Hung Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; Susumu Ono; Hsin-Hung Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
10 nm lines with 14 nm half pitch grating written in HSQ by electron beam direct write at 5 keV
|
Fu-Min Wang;Susumu Ono;Hsin-Hung Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; Susumu Ono; Hsin-Hung Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
A non-delta-chrome OPC methodology for nonlinear process models
|
Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
A non-delta-chrome OPC methodology for nonlinear process models
|
Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
A non-delta-chrome OPC methodology for nonlinear process models
|
Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Stochastic simulation of photon scattering for EUV mask defect inspection
|
Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Stochastic simulation of photon scattering for EUV mask defect inspection
|
Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Stochastic simulation of photon scattering for EUV mask defect inspection
|
Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Model-based proximity effect correction for electron-beam direct-write lithography
|
Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Model-based proximity effect correction for electron-beam direct-write lithography
|
Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Model-based proximity effect correction for electron-beam direct-write lithography
|
Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng |
