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"lei tf"的相關文件
顯示項目 21-30 / 214 (共22頁) << < 1 2 3 4 5 6 7 8 9 10 > >> 每頁顯示[10|25|50]項目
| 國立交通大學 |
2014-12-08T15:45:23Z |
Low contact resistance of poly-plug structure by in-situ HF-vapour cleaning
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Chen, JH; Lei, TF; Chao, TS; Su, TP; Huang, SJ; Tuan, A; Chen, SK |
| 國立交通大學 |
2014-12-08T15:45:12Z |
Improvement of polysilicon oxide integrity using NF3-annealing
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Yang, WL; Shieh, MS; Chen, YM; Chao, TS; Liu, DG; Lei, TF |
| 國立交通大學 |
2014-12-08T15:45:06Z |
Novel cleaning solutions for polysilicon film post chemical mechanical polishing
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Pan, TM; Lei, TF; Chen, CC; Chao, TS; Liaw, MC; Yang, WL; Tsai, MS; Lu, CP; Chang, WH |
| 國立交通大學 |
2014-12-08T15:45:01Z |
Robust ultrathin oxynitride dielectrics by NH3 nitridation and N2O RTA treatment
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Pan, TM; Lei, TF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:45:00Z |
Characteristics of polysilicon oxides combining N2O nitridation and CMP processes
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Lei, TF; Chen, JH; Wang, MF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:44:51Z |
High quality ultrathin CoTiO3 high-k gate dielectrics
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Pan, TM; Lei, TF; Chao, TS; Chang, KL; Hsieh, KC |
| 國立交通大學 |
2014-12-08T15:44:48Z |
Postexposure delay effect on linewidth variation in base added chemically amplified resist
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Ku, CY; Shieh, JM; Chiou, TB; Lin, HK; Lei, TF |
| 國立交通大學 |
2014-12-08T15:44:47Z |
Optimum conditions for novel one-step cleaning method for pre-gate oxide cleaning using robust design methodology
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Pan, TM; Lei, TF; Chao, TS; Liaw, MC; Lu, CP |
| 國立交通大學 |
2014-12-08T15:44:41Z |
Characteristics of TEOS polysilicon oxides: Improvement by CMP and high temperature RTA N-2/N2O annealing
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Chen, JH; Lei, TF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:44:20Z |
A novel thin-film transistor with self-aligned field induced drain
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Lin, HC; Yu, CM; Lin, CY; Yeh, KL; Huang, TY; Lei, TF |
顯示項目 21-30 / 214 (共22頁) << < 1 2 3 4 5 6 7 8 9 10 > >> 每頁顯示[10|25|50]項目
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