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Showing items 1-13 of 13 (1 Page(s) Totally)
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| 國立交通大學 |
2019-04-02T05:59:11Z |
Pulsed KrF laser annealing of Ni/Si0.76Ge0.24 films
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Luo, JS; Lin, WT; Chang, CY; Tsai, WC |
| 國立交通大學 |
2014-12-08T15:48:54Z |
Interfacial reactions of Ni on Si0.76Ge0.24 and Si by pulsed laser annealing
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Luo, JS; Lin, WT; Chang, CY; Tsai, WC |
| 國立交通大學 |
2014-12-08T15:48:43Z |
Interfacial reactions of Pd/Si0.76Ge0.24 by pulsed KrF laser annealing
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Chen, DR; Luo, JS; Lin, WT; Chang, CY; Shih, PS |
| 國立交通大學 |
2014-12-08T15:46:32Z |
Room temperature oxidation of Cu/Si0.76Ge0.24 annealed at 200 to 300 degrees C
|
Luo, JS; Lin, WT; Chang, CY; Shih, PS |
| 國立交通大學 |
2014-12-08T15:46:22Z |
Characterization of Si1-x-yGexCy films grown by C+ implantation and subsequent pulsed laser annealing
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Luo, JS; Lin, WT; Chang, CY; Shih, PS; Pan, FM; Chang, TC |
| 國立交通大學 |
2014-12-08T15:46:21Z |
Interfacial reactions of Co/Si0.76Ge0.24 and Co(Si0.76Ge0.24)/Si0.76Ge0.24 by pulsed KrF laser annealing
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Luo, JS; Hang, YL; Lin, WT; Chang, CY; Shih, PS |
| 國立交通大學 |
2014-12-08T15:46:02Z |
Effects of Mo-free C40Ti(Si1-xGex)(2) precursors and the thickness of an interposed Mo layer on the enhanced formation of C54Ti(Si1-xGex)(2)
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Luo, JS; Huang, JC; Lin, WT; Chang, CY; Shih, PS |
| 國立交通大學 |
2014-12-08T15:45:53Z |
Annealing effects on the interfacial reactions of Ni on Si0.76Ge0.24 and Si1-x-yGexCy
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Luo, JS; Lin, WT; Chang, CY; Shih, PS; Pan, FM |
| 國立交通大學 |
2014-12-08T15:45:14Z |
Interfacial reactions of Ni/Si0.76Ge0.24 and Ni/Si1-x-yGexCy by vacuum annealing and pulsed KrF laser annealing
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Luo, JS; Lin, WT; Chang, CY; Shih, PS |
| 國立交通大學 |
2014-12-08T15:45:14Z |
Pulsed KrF laser annealing of Mo/Si0.76Ge0.24
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Luo, JS; Lin, WT; Chang, CY; Shih, PS; Chang, TC |
| 國立交通大學 |
2014-12-08T15:44:46Z |
Effects of an interposed Mo layer on the interfacial reactions of Ti/Si0.76Ge0.24 by rapid thermal annealing and pulsed laser annealing
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Huang, JC; Luo, JS; Lin, WT; Chang, CY; Shih, PS |
| 國立交通大學 |
2014-12-08T15:01:52Z |
Interfacial reactions of the Co/Si1-xGex system
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Luo, JS; Lin, WT; Chang, CY; Tsai, WC; Wang, SJ |
| 國立交通大學 |
2014-12-08T15:01:24Z |
Pulsed KrF laser annealing of Ni/Si0.76Ge0.24 films
|
Luo, JS; Lin, WT; Chang, CY; Tsai, WC |
Showing items 1-13 of 13 (1 Page(s) Totally)
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