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Institution Date Title Author
國家衛生研究院 2016-03 Cranioplasty using a novel osteoconductive scaffold and platelet gel Tseng, CL;Chang, GW;Ou, KL;Chou, WT;Wu, TH;Fang, HW;Tsai, JC;Chen, TM
臺北醫學大學 2015 An Electrospinning Apparatus with a Sideway Motion Device and a Method of Using the Same Chen, CC;Yang, JC;Ker, CY;Liu, CY;Ou, KL
國立交通大學 2014-12-08T15:44:19Z Barrier capability of TaNx films deposited by different nitrogen flow rate against Cu diffusion in Cu/TaNx/n(+)-p junction diodes Yang, WL; Wu, WF; Liu, DG; Wu, CC; Ou, KL
國立交通大學 2014-12-08T15:42:00Z Improved TaN barrier layer against Cu diffusion by formation of an amorphous layer using plasma treatment Ou, KL; Wu, WF; Chou, CP; Chiou, SY; Wu, CC
國立交通大學 2014-12-08T15:41:47Z Improving the electrical integrity of Cu-CoSi2 contacted n(+)p junction diodes using nitrogen-incorporated Ta films as a diffusion barrier Yang, WL; Wu, WF; You, HC; Ou, KL; Lei, TF; Chou, CP
國立交通大學 2014-12-08T15:41:21Z Effects of nitrogen plasma treatment on tantalum diffusion barriers in copper metallization Wu, WF; Ou, KL; Chou, CP; Wu, CC
國立交通大學 2014-12-08T15:41:19Z PECVD-Ti/TiNx barrier with multilayered amorphous structure and high thermal stability for copper metallization Wu, WF; Ou, KL; Chou, CP; Hsu, JL
國立交通大學 2014-12-08T15:37:01Z Barrier capability of HfN films with various nitrogen concentrations against copper diffusion in CuHf-N/n(+)-p junction diodes Ou, KL; Chiou, SY; Lin, MH; Hsu, RQ
國立交通大學 2014-12-08T15:36:55Z Comparative study of polycrystalline Ti, amorphous Ti, and multiamoIrphous Ti as a barrier film for Cu interconnect Ou, KL; Yu, MS; Hsu, RQ; Lin, MH
國立交通大學 2014-12-08T15:19:10Z Study of the morphologies and dielectric constants of nanoporous materials derived from benzoxazine-terminated poly(epsilon-caprolactone)/polybenzoxazine co-polymers Su, YC; Chen, WC; Ou, KL; Chang, FC

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