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Showing items 71-80 of 135  (14 Page(s) Totally)
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Institution Date Title Author
國立臺灣大學 2003 Ultra-thin Cr2O3 well-crystallized films for high transmittance APSM in ArF line Lai, F. D.; Huang, C. Y.; Chang, C. M.; Wang, L. A.; Cheng, W. C.
國立臺灣大學 2003 Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications Chen, H. L.; Chuang, Y. F.; Lee, C. C.; Hsieh, C. I.; Ko, F. H.; Wang, L. A.
國立臺灣大學 2003 A Highly Efficient Polarized Superfluorescent Fiber Source for Fiber-Optic Gyroscope Applications Su, H.C.; Wang, L.A.
國立臺灣大學 2003 Ultrathin TiO2 amorphous films for high transmittance APSM blanks at 157 and 193 nm wavelength simultaneously Lai, F. D.; Chang, C. M.; Wang, L. A.; Yih, T. S.
國立臺灣大學 2003 Phase masks working in 157 nm wavelength fabricated by immersion interference photolithography Cheng, W. C.; Wang, L. A.
國立高雄第一科技大學 2002.06 Design of (ZrO2)x/(Cr2O3)y/(Al2O3)1-x-y superlattices for high transmittance APSM at 193 nm wavelength LAI, F.D.;WANG, L.A.
國立臺灣大學 2002-03 An insertion loss insensitive and mean wavelength stable polarized superfluorescent fiber source Wang, L.A.; Lee, C.D.; Su, H.C.; Chang, J.F.
國立臺灣大學 2002 Study of the Synthesis and Characterization of Methacrylate Photoresists Fu, S.C.; Lin, H.W.; Chou, W.Y.; Wang, L.A.; Hsieh, K.H.
國立臺灣大學 2002 Fabrication and characterization of aluminum oxide/chromium oxide superlattice for attenuated phase-shifting mask working at 193 nm wavelength Lai, F. D.; Wang, L. A.
國立臺灣大學 2002 Design of (ZrO2)x/(Cr2O3)y/(Al2O3)1?x?y superlattices for high transmittance APSM at 193 nm wavelength Lai, F. D.; Wang, L. A.

Showing items 71-80 of 135  (14 Page(s) Totally)
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