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"wang th"的相關文件
顯示項目 11-60 / 121 (共3頁) 1 2 3 > >> 每頁顯示[10|25|50]項目
| 中山醫學大學 |
2020 |
Flavonoids Identification and Pancreatic Beta-Cell Protective Effect of Lotus Seedpod
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Lee, MS; Chyau, CC; Wang, CP; Wang, TH; Chen, JH; Lin, HH |
| 中山醫學大學 |
2020 |
Structural Validity of an ICF-Based Measure of Activity and Participation for Children in Taiwan's Disability Eligibility Determination System
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Hwang, AW; Yen, CF; Liao, HF; Chi, WC; Liou, TH; Chang, BS; Wu, TF; Kang, LJ; Lu, SJ; Simeonsson, RJ; Wang, TH; Bedell, G |
| 國立交通大學 |
2019-04-02T06:04:36Z |
CHARACTERIZATION AND SIMULATION OF HOT CARRIER EFFECT ON ERASING GATE CURRENT IN FLASH EEPROMS
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HUANG, CM; WANG, TH; CHEN, T; PENG, NC; CHANG, A; SHONE, FC |
| 臺大學術典藏 |
2018-09-10T06:47:20Z |
Effective prevention and treatment of Helicobacter pylori infection using a combination of catechins and sialic acid in AGS cells and BALB/c mice
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Yang, JC;Shun, CT;Chien, CT;Wang, TH.; Yang, J.-C. and Shun, C.-T. and Chien, C.-T. and Wang, T.-H.; Yang, JC; JYH-CHIN YANG; CHIA-TUNG SHUN; Shun, CT; Chien, CT; Wang, TH. |
| 國立交通大學 |
2018-08-21T05:53:38Z |
A global pinching theorem for surfaces with constant mean curvature in S-3
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Hsu, YJ; Wang, TH |
| 國立交通大學 |
2014-12-08T15:48:54Z |
Investigation of oxide charge trapping and detrapping in a MOSFET by using a GIDL current technique
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Wang, TH; Chang, TE; Chiang, LP; Wang, CH; Zous, NK; Huang, CM |
| 國立交通大學 |
2014-12-08T15:48:47Z |
Characterization of various stress-induced oxide traps in MOSFET's by using a subthreshold transient current technique
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Wang, TH; Chiang, LP; Zous, NK; Chang, TE; Huang, C |
| 國立交通大學 |
2014-12-08T15:46:18Z |
Transient effects of positive oxide charge on stress-induced leakage current in tunnel oxides
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Zous, NK; Wang, TH; Yeh, CC; Tsai, CW; Huang, CM |
| 國立交通大學 |
2014-12-08T15:46:14Z |
A comprehensive study of hot carrier stress-induced drain leakage current degradation in thin-oxide n-MOSFET's
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Wang, TH; Chiang, LP; Zous, NK; Hsu, CF; Huang, LY; Chao, TS |
| 國立交通大學 |
2014-12-08T15:44:34Z |
Hot carrier reliability improvement by utilizing phosphorus transient enhanced diffusion for input/output devices of deep submicron CMOS technology
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Wang, HCH; Diaz, CH; Liew, BK; Sun, JYC; Wang, TH |
| 國立交通大學 |
2014-12-08T15:44:15Z |
Interface induced uphill diffusion of boron: An effective approach for ultrashallow junction
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Wang, HCH; Wang, CC; Chang, CS; Wang, TH; Griffin, PB; Diaz, CH |
| 國立交通大學 |
2014-12-08T15:43:58Z |
On-chip ESD protection design by using polysilicon diodes in CMOS process
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Ker, MD; Chen, TY; Wang, TH; Wu, CY |
| 國立交通大學 |
2014-12-08T15:43:09Z |
Inequalities between Dirichlet and Neumann eigenvalues for domains in spheres
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Hsu, YJ; Wang, TH |
| 國立交通大學 |
2014-12-08T15:43:07Z |
A global pinching theorem for surfaces with constant mean curvature in S-3
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Hsu, YJ; Wang, TH |
| 國立交通大學 |
2014-12-08T15:42:55Z |
Arsenic/phosphorus LDD optimization by taking advantage of phosphorus transient enhanced diffusion for high voltage input/output CMOS devices
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Wang, HCH; Wang, CC; Diaz, CH; Liew, BK; Sun, JYC; Wang, TH |
| 國立交通大學 |
2014-12-08T15:42:37Z |
Enhanced negative-bias-temperature instability of P-channel metal-oxide-semiconductor transistors due to plasma charging damage
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Lee, DY; Lin, HC; Wang, MF; Tsai, MY; Huang, TY; Wang, TH |
| 國立交通大學 |
2014-12-08T15:41:47Z |
Role of positive trapped charge in stress-induced leakage current for flash EEPROM devices
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Wang, TH; Zous, NK; Yeh, CC |
| 國立交通大學 |
2014-12-08T15:41:10Z |
A novel soft-program for a narrow erased state Vt distribution, read disturbance suppression and over-program annihilation in multilevel cell flash memories
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Yeh, CC; Fan, TH; Lu, TC; Wang, TH; Pan, S; Lu, CY |
| 國立交通大學 |
2014-12-08T15:41:07Z |
Auger recombination-enhanced hot carrier degradation in nMOSFETs with a forward substrate bias
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Tsai, CW; Chen, MC; Ku, SH; Wang, TH |
| 國立交通大學 |
2014-12-08T15:39:34Z |
Positive oxide charge-enhanced read disturb in a localized trapping storage flash memory cell
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Tsai, WJ; Yeh, CC; Zous, NK; Liu, CC; Cho, SK; Wang, TH; Pan, SC; Lu, CY |
| 國立交通大學 |
2014-12-08T15:39:14Z |
An endurance evaluation method for flash EEPROM
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Zous, NK; Chen, YJ; Chin, CY; Tsai, WJ; Lu, TC; Chen, MS; Lu, WP; Wang, TH; Pan, SC; Lu, CY |
| 國立交通大學 |
2014-12-08T15:38:52Z |
Temperature effect on read current in a two-bit nitride-based trapping storage flash EEPROM cell
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Liu, MY; Chang, YW; Zous, NK; Yang, I; Lu, TC; Wang, TH; Ting, WC; Ku, J; Lu, CY |
| 國立交通大學 |
2014-12-08T15:38:44Z |
Pocket implantation effect on drain current flicker noise in analog nMOSFET devices
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Wu, JW; Cheng, CC; Chiu, KL; Guo, JC; Lien, WY; Chang, CS; Huang, GW; Wang, TH |
| 國立交通大學 |
2014-12-08T15:38:41Z |
Soft breakdown enhanced hysteresis effects in ultrathin oxide silicon-on-insulator metal-oxide-semiconductor field effect transistors
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Chen, MC; Ku, SH; Chan, CT; Wang, TH |
| 國立交通大學 |
2014-12-08T15:38:37Z |
A novel erase scheme to suppress overerasure in a scaled 2-bit nitride storage flash memory cell
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Yeh, CC; Wang, TH; Tsai, WJ; Lu, TC; Liao, YY; Chen, HY; Zous, NK; Ting, WC; Ku, J; Lu, CY |
| 國立交通大學 |
2014-12-08T15:38:37Z |
Lateral migration of trapped holes in a nitride storage flash memory cell and its qualification methodology
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Zous, NK; Lee, MY; Tsai, WJ; Kuo, A; Huang, LT; Lu, TC; Liu, CJ; Wang, TH; Lu, WP; Ting, WC; Ku, J; Lu, CY |
| 國立交通大學 |
2014-12-08T15:38:31Z |
Comparison of oxide breakdown progression in ultra-thin oxide silicon-on-insulator and bulk metal-oxide-semiconductor field effect transistors
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Chen, MC; Ku, SH; Chan, CT; Wang, TH |
| 國立交通大學 |
2014-12-08T15:27:51Z |
INTERFACE TRAP INDUCED THERMIONIC AND FIELD EMISSION CURRENT IN OFF-STATE MOSFETS
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WANG, TH; CHANG, TE; HUANG, CM |
| 國立交通大學 |
2014-12-08T15:27:37Z |
Field enhanced oxide charge detrapping in n-MOSFET's
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Wang, TH; Chang, TE; Chiang, LP; Huang, C |
| 國立交通大學 |
2014-12-08T15:27:37Z |
Mechanisms and characteristics of oxide charge detrapping in n-MOSFET's
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Wang, TH; Chang, TE; Chiang, LP; Huang, CM; Guo, JC |
| 國立交通大學 |
2014-12-08T15:27:30Z |
A new technique to measure an oxide trap density in a hot carrier stressed n-MOSFET
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Wang, TH; Chiang, LP; Chang, TE; Zous, NK; Shen, KY; Huang, C |
| 國立交通大學 |
2014-12-08T15:27:29Z |
Investigation of oxide charge trapping and detrapping in a n-MOSFET
|
Wang, TH; Chang, TE; Chiang, LP; Zous, NK; Huang, C |
| 國立交通大學 |
2014-12-08T15:27:27Z |
Characterization of various stress-induced oxide traps in MOSFET's by using a novel transient current technique
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Wang, TH; Chiang, LP; Zous, NK; Chang, TE; Huang, C |
| 國立交通大學 |
2014-12-08T15:27:15Z |
Voltage scaling and temperature effects on drain leakage current degradation in a hot carrier stressed n-MOSFET
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Wang, TH; Hsu, CF; Chiang, LP; Zous, NK; Chao, TS; Chang, CY |
| 國立交通大學 |
2014-12-08T15:27:09Z |
A comparative study of SILC transient characteristics and mechanisms in FN stressed and hot hole stressed tunnel oxides
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Zous, NK; Wang, TH; Yeh, CC; Tsai, CW; Huang, CM |
| 國立交通大學 |
2014-12-08T15:26:57Z |
Valence-band tunneling enhanced hot carrier degradation in ultra-thin oxide nMOSFETs
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Tsai, CW; Gu, SH; Chiang, LP; Wang, TH; Liu, YC; Huang, LS; Wang, MC; Hsia, LC |
| 國立交通大學 |
2014-12-08T15:26:38Z |
Soft breakdown enhanced hysteresis effects in ultra-thin oxide SOI nMOSFETs
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Chen, MC; Tsai, CW; Gu, SH; Wang, TH |
| 國立交通大學 |
2014-12-08T15:26:23Z |
Negative substrate bias enhanced breakdown hardness in ultra-thin oxide pMOSFETs
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Wang, TH; Tsai, CW; Chen, MC; Chan, CT; Chiang, HK; Lu, SH; Hu, HC; Chen, TF; Yang, CK; Lee, MT; Wu, DY; Chen, JK; Chien, SC; Sun, SW |
| 國立交通大學 |
2014-12-08T15:26:17Z |
Impacts of HF etching on ultra-thin core gate oxide integrity in dual gate oxide CMOS technology
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Lee, DY; Lin, HC; Chen, CL; Huang, TY; Wang, TH; Lee, TL; Chen, SC; Liang, MS |
| 國立交通大學 |
2014-12-08T15:25:57Z |
Multi-level memory systems using error control codes
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Chang, HC; Lin, CC; Hsiao, TY; Wu, JT; Wang, TH |
| 國立交通大學 |
2014-12-08T15:25:49Z |
Comparison of oxide breakdown progression in ultra-thin oxide SOI and bulk pMOSFETs
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Chan, CT; Kuo, CH; Tang, CJ; Chen, MC; Wang, TH; Lu, SH; Hu, HC; Chen, TF; Yang, CK; Lee, MT; Wu, DY; Chen, JK; Chien, SC; Sun, SW |
| 國立交通大學 |
2014-12-08T15:25:47Z |
Investigation of programmed charge lateral spread in a two-bit storage nitride flash memory cell by using a charge pumping technique
|
Gu, SH; Wang, MT; Chan, CT; Zous, NK; Yeh, CC; Tsai, WJ; Lu, TC; Wang, TH; Ku, J; Lu, CY |
| 國立交通大學 |
2014-12-08T15:25:27Z |
Investigation of post-NBTI stress recovery in pMOSFETs by direct measurement of single oxide charge de-trapping
|
Chan, CT; Ma, HC; Tang, CJ; Wang, TH |
| 國立交通大學 |
2014-12-08T15:19:37Z |
A novel fully CMOS process compatible PREM for SOC applications
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Yeh, CC; Wang, TH; Tsai, WJ; Lu, TC; Liao, YY; Zous, NK; Chin, CY; Chen, YR; Chen, MS; Ting, WC; Lu, CY |
| 國立交通大學 |
2014-12-08T15:19:29Z |
A novel PHINES flash memory cell with low power program/erase, small pitch, two-bits-per-cell for data storage applications
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Yeh, CC; Wang, TH; Tsai, WJ; Lu, TC; Chen, MS; Liao, YY; Ting, WC; Ku, YHJ; Lu, CY |
| 國立交通大學 |
2014-12-08T15:18:55Z |
Mechanism for slow switching effect in advanced low-voltage, high-speed Pb(Zr1-XTiX)O-3 ferroelectric memory
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Tsai, CW; Lai, SC; Yen, CT; Lien, HM; Lung, HL; Wu, TB; Wang, TH; Liu, R; Lu, CY |
| 國立交通大學 |
2014-12-08T15:18:45Z |
Substrate-bias-dependent dielectric breakdown in ultrathin-oxide p-metal-oxide-semiconductor field-effect transistors
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Chiang, S; Lu, MF; Huang-Lu, S; Chien, SC; Wang, TH |
| 國立交通大學 |
2014-12-08T15:18:29Z |
Excess low-frequency noise in ultrathin oxide n-MOSFETs arising from valence-band electron tunneling
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Wu, JW; You, JW; Ma, HC; Cheng, CC; Hsu, CF; Chang, CS; Huang, GW; Wang, TH |
| 國立交通大學 |
2014-12-08T15:17:56Z |
Electromigration lifetime improvement of copper interconnect by cap/dielectric interface treatment and geometrical design
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Lin, MH; Lin, YL; Chen, JM; Yeh, MS; Chang, KP; Su, KC; Wang, TH |
| 國立交通大學 |
2014-12-08T15:17:37Z |
Characterization of programmed charge lateral distribution in a two-bit storage nitride flash memory cell by using a charge-pumping technique
|
Gu, SH; Wang, TH; Lu, WP; Ting, WC; Ku, YHJ; Lu, CY |
顯示項目 11-60 / 121 (共3頁) 1 2 3 > >> 每頁顯示[10|25|50]項目
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