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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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Institution Date Title Author
臺大學術典藏 2020-01-06T03:11:56Z Intermittent pressurized operation of steam explosion pretreatment system Liao, Y.-C.; Yen, F.-Y.; Hung, F.; Su, C.-H.; Chen, W.-H.; YING-CHIH LIAO
國立交通大學 2014-12-08T15:15:52Z HfSiON n-MOSFETs using low-work function HfSi chi gate Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, S. J.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S.
國立交通大學 2014-12-08T15:14:46Z High-temperature stable IrxSi gates with high work function on HfSiON p-MOSFETs Hung, B. F.; Wu, C. H.; Chin, Albert; Wang, S. J.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, Shih C.; Liang, Mong-Song
國立交通大學 2014-12-08T15:14:22Z High-temperature stable HfLaON p-MOSFETs with high-work-function Ir3Si gate Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, S. J.; Wang, X. P.; Li, M. -F.; Zhu, C.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S.
國立成功大學 2007-04 High-temperature stable HfLaON p-MOSFETs with high-work-function Ir3Si gate Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, S. J.; Wang, X. P.; Li, M. F.; Zhu, C.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S.
國立成功大學 2007-02 High-temperature stable IrxSi gates with high work function on HfSiON p-MOSFETs Hung, B. F.; Wu, C. H.; Chin, Albert; Wang, S. J.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, Shih C.; Liang, Mong-Song
國立成功大學 2006-09 HfSiON n-MOSFETs using low-work function HfSi chi gate Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, Shui-Jinn; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S.
國立成功大學 2006-06 HfAlON n-MOSFETs incorporating low-work function gate using ytterbium silicide Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, Shui-Jinn; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S.

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