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Showing items 186-195 of 214  (22 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:03:03Z LOW-TEMPERATURE GROWTH OF SILICON-BORON LAYER AS SOLID DIFFUSION SOURCE FOR POLYSILICON CONTACTED P(+)-N SHALLOW JUNCTION LEI, TF; CHEN, TP; LIN, HC; CHANG, CY
國立交通大學 2014-12-08T15:03:03Z CHARACTERISTICS OF TOP-GATE THIN-FILM TRANSISTORS FABRICATED ON NITROGEN-IMPLANTED POLYSILICON FILMS YANG, CK; LEI, TF; LEE, CL
國立交通大學 2014-12-08T15:03:01Z CHARACTERISTICS OF POLYCRYSTALLINE FILMS GROWN BY ULTRAHIGH-VACUUM CHEMICAL-VAPOR-DEPOSITION SYSTEM LIN, HY; LEI, TF; LIN, HC; CHANG, CY; TWU, RC; DENG, RC; LIN, JD
國立交通大學 2014-12-08T15:03:00Z RADIATION EFFECTS ON N-CHANNEL POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS YANG, CK; LEE, CL; LEI, TF; CHERN, HN
國立交通大學 2014-12-08T15:02:53Z Characterization of thin textured tunnel oxide prepared by thermal oxidation of thin polysilicon film on silicon Wu, SL; Chiao, DM; Lee, CL; Lei, TF
國立交通大學 2014-12-08T15:02:53Z Suppression of the boron penetration induced dielectric degradation by using a stacked-amorphous-silicon film as the gate structure for pMOSFET Wu, SL; Lee, CL; Lei, TF
國立交通大學 2014-12-08T15:02:49Z Fabrication of thin film transistors by chemical mechanical polished polycrystalline silicon films Chang, CY; Lin, HY; Lei, TF; Cheng, JY; Chen, LP; Dai, BT
國立交通大學 2014-12-08T15:02:47Z The influence of Ge-implantation on the electrical characteristics of the ultra-shallow junction formed by using silicide as a diffusion source Huang, CT; Lei, TF; Chu, CH; Shvu, SH
國立交通大學 2014-12-08T15:02:40Z A novel vertical bottom-gate polysilicon thin film transistor with self-aligned offset Lai, CS; Lee, CL; Lei, TF; Chern, HN
國立交通大學 2014-12-08T15:02:33Z Nitridization of the stacked poly-Si gate to suppress the boron penetration in pMOS Lin, YH; Lai, CS; Lee, CL; Lei, TF; Chao, TS

Showing items 186-195 of 214  (22 Page(s) Totally)
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