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Showing items 556991-557000 of 2346275  (234628 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:27:25Z Low supply voltage CMOS charge pumps Wu, JT; Chang, KL
國立臺灣科技大學 2019 Low supply voltage control oscillator with transformer feedback for photoplethysmography Lai, W.-C.;Jang, S.-L.;Lin, Y.-C.
國立成功大學 2016-11-01 Low switching-threshold-voltage zinc oxide nanowire array resistive random access memory Shen, Guan-Hung; Tandio, Andrew Ronaldi; Lin, Mei-Yu; Lin, Gao-Feng; Chen, Kai-Huang; Hong, Franklin Chau-Nan
高雄醫學大學 2011 Low target blood concentration (Ct) of propofol target controlled infusion reduces the risk of hypotension during endoscopy in Taiwanese population  許文鴻;王聖雯;盧奕丞;程廣義;朱光興;施翔耀;潘永生;余方榮;吳登強 
國立東華大學 2006-07 Low temp. kinetics and energetics of the electron and hole traps in irradiated TiO2 nanoparticles as revealed by EPR spectroscopy Wong,M.S.; Ke,S.C.; Gopal,N.O.; Wang,T.C.
國立交通大學 2014-12-08T15:27:34Z Low temperature (850 degrees C) two-step N2O annealed thin gate oxides Lai, CS; Lee, CL; Lei, TF; Chao, TS; Peng, CH; Wang, HC
國立交通大學 2014-12-08T15:35:16Z Low Temperature (< 180 degrees C) Bonding for 3D Integration Huang, Yan-Pin; Tzeng, Ruoh-Ning; Chien, Yu-San; Shy, Ming-Shaw; Lin, Teu-Hua; Chen, Kou-Hua; Chuang, Ching-Te; Hwang, Wei; Chiu, Chi-Tsung; Tong, Ho-Ming; Chen, Kuan-Neng
國立交通大學 2014-12-08T15:35:46Z Low Temperature (< 180 degrees C) Wafer-level and Chip-level In-to-Cu and Cu-to-Cu Bonding for 3D Integration Chien, Yu-San; Huang, Yan-Pin; Tzeng, Ruoh-Ning; Shy, Ming-Shaw; Lin, Teu-Hua; Chen, Kou-Hua; Chuang, Ching-Te; Hwang, Wei; Chiou, Jin-Chern; Chiu, Chi-Tsung; Tong, Ho-Ming; Chen, Kuan-Neng
臺大學術典藏 2021-08-05T02:38:16Z Low Temperature (<40 C) Atmospheric-Pressure Dielectric-Barrier-Discharge-jet (DBDjet) Plasma Treatment on Jet-Sprayed Silver Nanowires (AgNWs) Electrodes for Fully Solution-Processed n-i-p Structure Perovskite Solar Cells Fan C.-F;Tsai J.-H;Liao Y.-C;Cheng I.-C;Hsu C.-C;Chen J.-Z.; Fan C.-F; Tsai J.-H; Liao Y.-C; Cheng I.-C; Hsu C.-C; Chen J.-Z.; JERRY CHENG-CHE HSU
國立臺灣大學 2007 Low temperature (<400 ?C) Al2O3 ultrathin gate dielectrics prepared by shadow evaporation of aluminum followed by nitric acid oxidation Chiang, Jung-Chin; Hwu, Jenn-Gwo

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