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Institution	Date	Title	Author
國家衛生研究院	2021-08-16	Ultra-small platinum nanoparticle-enabled catalysis and corrosion susceptibility reverse tumor hypoxia for cancer chemoimmunotherapy	Liao, FH;Yao, CN;Wu, TH;Chen, SP;Yeh, LC;Lin, SY;Lin, WJ
國立聯合大學	2004	Ultra-Thin Aluminum Oxide Gate Dielectric on N-Type 4H-SiC Prepared by Low Thermal Budget Nitric Acid Oxidation	胡振國, S.W.Huang and J.G.Hwu
國立高雄第一科技大學	2003.06	Ultra-thin Cr2O3 well-crystallized films for high transmittance APSM in ArF line	Lai, F.D;Huang, C.Y;Chang, C.M;Wang, L.A;Cheng, W.C
國立臺灣大學	2003	Ultra-thin Cr2O3 well-crystallized films for high transmittance APSM in ArF line	Lai, F. D.; Huang, C. Y.; Chang, C. M.; Wang, L. A.; Cheng, W. C.
臺大學術典藏	2003-06	Ultra-thin Cr₂O₃ Well-crystallized films for high transmittance APSM in ArF line	F. D. Lai,; C. Y. Huang,; C. M. Chang,; L. A. Wang,; W. C. Cheng,; LON A. WANG
國立成功大學	1998	Ultra-Thin Gas Squeeze Film Characteristics for Infinitely Large Squeeze Number	Li, Wang-Long
臺大學術典藏	2018-09-10T03:44:48Z	Ultra-thin gate oxides prepared by alternating current anodization of silicon followed by rapid thermal anneal	Chen, Y.-C.; Lee, C.-Y.; Hwu, J.-G.; JENN-GWO HWU
國立臺灣大學	2001	Ultra-thin gate oxides prepared by alternating current anodization of silicon followed by rapid thermal anneal	Chen, Yung-Chieh; Lee, Chuang-Yuan; Hwu, Jenn-Gwo
國立聯合大學	2004	Ultra-thin HfO2 Gate Dielectrics Prepared by Oxidation of Hf Metal Film in Nitric Acid Followed by High Temperature Anneal	胡振國, C.S.Kuo, L.S.Lee, M.J.Tsai, and J.G.Hwu
臺大學術典藏	2019-12-27T06:48:25Z	Ultra-Thin Layered Ternary Single Crystals [Sn(S x Se 1?x ) 2 ] with Bandgap Engineering for High Performance Phototransistors on Versatile Substrates	Perumal, P.; Perumal, P.; YANG-FANG CHEN et al.

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