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Showing items 903996-904005 of 2348674 (234868 Page(s) Totally)
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| 國立臺灣大學 |
2004 |
Use of Simulect Can Reduce the Incidence of Acute Rejection and Demonstrates with Superior 3-Year Patient and Graft Survival Rates in Renal Transplantation
|
朱聖賢; 江仰仁; 李伯皇; 胡瑞恆; 賴明坤; 闕士傑; 蔡孟昆; CHU, SHENG-HSIEN; CHIANG, YANG-JEN; LEE, PO-HUANG; HU, REY-HENG; LAI, MING-KUEN; CHUEH, SHIH-CHIEH; TSAI, MENG-KUNG |
| 臺大學術典藏 |
2018-09-10T04:42:35Z |
Use of simulect can reduce the incidence of acute rejection and demonstrates with superior 3-year patient and graft survival rates in renal transplantation
|
Chu, S.-H. and Chiang, Y.-J. and Huang, C.-C. and Lee, P.-H. and Hu, R.-H. and Lai, M.-K. and Chueh, S.-C. and Tsai, M.-K.; PO-HUANG LEE; MENG-KUN TSAI; REY-HENG HU |
| 臺大學術典藏 |
2019-12-04T02:00:14Z |
Use of simulect can reduce the incidence of acute rejection and demonstrates with superior 3-year patient and graft survival rates in renal transplantation
|
MENG-KUN TSAI; Chu S.-H.;Chiang Y.-J.;Huang C.-C.;Lee P.-H.;Hu R.-H.;Lai M.-K.;Chueh S.-C.;Meng-Kun Tsai; Chu S.-H.; Chiang Y.-J.; Huang C.-C.; Lee P.-H.; Hu R.-H.; Lai M.-K.; Chueh S.-C. |
| 臺大學術典藏 |
2020-02-24T01:34:04Z |
Use of simulect can reduce the incidence of acute rejection and demonstrates with superior 3-year patient and graft survival rates in renal transplantation
|
Chu S.-H.;Chiang Y.-J.;Huang C.-C.;Lee P.-H.;Rey-Heng Hu;Lai M.-K.;Chueh S.-C.;Tsai M.-K.; Chu S.-H.; Chiang Y.-J.; Huang C.-C.; Lee P.-H.; REY-HENG HU; Lai M.-K.; Chueh S.-C.; Tsai M.-K. |
| 高雄醫學大學 |
2007 |
Use of single saphenous interposition vein graft for primary arterial circuit and secondary recipient site in head and neck reconstruction: a case report
|
張高評;李孝貞;賴春生;林幸道 ; Chang;KP;Lee;HC;Lai;CS;Lin;SD |
| 臺大學術典藏 |
2018-09-10T07:36:13Z |
Use of SiO 2 nanoparticles As etch mask to generate Large-area GaAs nanowires by Induced-Coupled Plasma Reactive Ion Etcher
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Wang, D.-S.;Chao, J.-J.;Lin, C.-F.; Wang, D.-S.; Chao, J.-J.; Lin, C.-F.; CHING-FUH LIN |
| 臺大學術典藏 |
2006 |
Use of SiO2 nanoparticles as etch mask to generate Si nanorods by reactive ion etch
|
Liang, Eih-Zhe; Huang, Chao-Jei; Lin, Ching-Fuh; Liang, Eih-Zhe; Huang, Chao-Jei; Lin, Ching-Fuh |
| 國立臺灣大學 |
2006 |
Use of SiO2 nanoparticles as etch mask to generate Si nanorods by reactive ion etch
|
Liang, Eih-Zhe; Huang, Chao-Jei; Lin, Ching-Fuh |
| 國立臺灣大學 |
2006-04 |
Use of SiO2 nanoparticles as etch mask to generate Si nanorods by reactive ion etch
|
Liang, Eih-Zhe; Huang, Chao-Jei; Lin, Ching-Fuh |
| 臺大學術典藏 |
2009 |
Use of SiO2 nanoparticles as etch mask to generate large-area GaAs nanowires by Induced-Coupled Plasma Reactive Ion Etcher
|
Wang, D.-S.;Chao, J.-J.;Lin, C.-F.; Wang, D.-S.; Chao, J.-J.; Lin, C.-F.; CHING-FUH LIN |
Showing items 903996-904005 of 2348674 (234868 Page(s) Totally)
<< < 90395 90396 90397 90398 90399 90400 90401 90402 90403 90404 > >>
View [10|25|50] records per page
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