| 臺大學術典藏 |
2022-03-22T08:30:31Z |
Lithographic in-mold patterning for CsPbBr3nanocrystals distributed Bragg reflector single-mode laser
|
Ahmad Kamal A.S;Lin C.-C;Xing D;Lee Y.-C;Wang Z;Chen M.-H;Ho Y.-L;Chen C.-W;Delaunay J.-J.; Ahmad Kamal A.S; Lin C.-C; Xing D; Lee Y.-C; Wang Z; Chen M.-H; Ho Y.-L; Chen C.-W; Delaunay J.-J.; CHUN-WEI CHEN |
| 臺大學術典藏 |
2022-03-22T08:30:33Z |
Lithographic in-mold patterning for CsPbBr3nanocrystals distributed Bragg reflector single-mode laser
|
Ahmad Kamal A.S;Lin C.-C;Xing D;Lee Y.-C;Wang Z;Chen M.-H;Ho Y.-L;Chen C.-W;Delaunay J.-J.; Ahmad Kamal A.S; Lin C.-C; Xing D; Lee Y.-C; Wang Z; Chen M.-H; Ho Y.-L; Chen C.-W; Delaunay J.-J.; CHUN-WEI CHEN |
| 臺大學術典藏 |
2021-10-21T23:27:30Z |
Lithographic in-mold patterning for CsPbBr3nanocrystals distributed Bragg reflector single-mode laser
|
Ahmad Kamal, Ahmad Syazwan; Lin, Cheng Chieh; Xing, Di; Lee, Yang Chun; Wang, Zhiyu; Chen, Mu Hsin; Ho, Ya Lun; CHUN-WEI CHEN; Delaunay, Jean Jacques |
| 國立臺灣科技大學 |
2008 |
Lithographical Method by Oxidation through a Conductive Template in Contact with a Silicon Substrate Mediated by a Thin Water Layer
|
Hsieh, Chi-Hsiang ; Liao, Jiunn-Der ; Kuo, Chang-Shu ; Huang, Chao-Yu ; Wu, Bo-Hsiung ; Chang, Fuh-Yu |
| 國立成功大學 |
2008-04 |
Lithographical method by oxidation through a conductive template in contact with a silicon substrate mediated by a thin water layer
|
Hsieh, Chi-Hsiang; Liao, Jiunn-Der; Kuo, Chang-Shu; Huang, Chao-Yu; Wu, Bo-Hsiung; Chang, Fuh-Yu |
| 國立交通大學 |
2014-12-08T15:32:21Z |
Lithographically fabricable, optimized three-dimensional solar cell random structure
|
Lin, Albert S.; Zhong, Yan-Kai; Fu, Sze-Ming; Tseng, Chi-Wei; Lai, Shih-Yun; Lai, Wei-Ming |
| 國立交通大學 |
2014-12-08T15:28:24Z |
Lithographically-definable Solar Cell Random Reflector using Genetic Algorithm Optimization
|
Lin, Albert S.; Fu, Sze-Ming; Zhong, Yan-Kai |
| 南台科技大學 |
2004 |
Lithography Fabrication on the Capillarity-Driven Valve
|
魏慶華; Jong-Zen Huang;Ching-Hua Wei;Chia-Rong Chen |
| 中原大學 |
2003 |
Lithography Overlay 幾何誤差分析研究
|
張耀仁 |
| 國立成功大學 |
2024-11-01 |
Lithography reticle scheduling in semiconductor manufacturing
|
Lee;Chia-Yen;Wu;Cheng-Man;Hsu;Chia-Yi;Xie;Hui-Hua;Fang;Yu-Hsueh |
