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教育部委托研究计画 计画执行:国立台湾大学图书馆
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显示项目 706791-706800 / 2348419 (共234842页) << < 70675 70676 70677 70678 70679 70680 70681 70682 70683 70684 > >> 每页显示[10|25|50]项目
| 國立臺灣海洋大學 |
1989 |
Radiation from Turbulent Diffusion Flames
|
G. M. Faeth;J. P. Gore;S. G. Chuech;S.-M. Jeng |
| 臺大學術典藏 |
1993 |
Radiation Hard Process for Rapid Thermal Reoxidized Nitrided Oxides
|
Hwu, Jenn-Gwo; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1993 |
Radiation Hard Process for Rapid Thermal Reoxidized Nitrided Oxides
|
胡振國; Hwu, Jenn-Gwo |
| 國立暨南國際大學 |
2006 |
Radiation hardness comparison of MOS capacitors using tungsten polycide and cobalt polycide as gate electrode materials
|
呂育興?; Lu, YH |
| 國立暨南國際大學 |
2005 |
Radiation hardness comparison of MOS capacitors using tungsten polycide and cobalt polycide as gate electrode materials
|
吳幼麟?; Wu, YL |
| 臺大學術典藏 |
2009-04-27T04:27:06Z |
Radiation Hardness of Coplanar Submicron Gap Charge-Coupled Devices (CCD) with Rapid Thermal Nitrided Oxides
|
Hwu, Jenn-Gwo; Lee, K. C.; 胡振國; Lee, K. C.; Hwu, Jenn-Gwo; Lee, K. C. |
| 臺大學術典藏 |
2009-04-27T04:28:29Z |
Radiation Hardness of Coplanar Submicron Gap Charge-Coupled Devices (CCD) with Rapid Thermal Nitrided Oxides
|
Lee, G. C.; Hwu, Jenn-Gwo; Lee, G. C.; 胡振國; Lee, G. C.; Hwu, Jenn-Gwo; Lee, G. C. |
| 國立臺灣大學 |
1995 |
Radiation Hardness of Coplanar Submicron Gap Charge-Coupled Devices (CCD) with Rapid Thermal Nitrided Oxides
|
胡振國; Lee, K. C.; Hwu, Jenn-Gwo; Lee, K. C. |
| 國立臺灣大學 |
1993 |
Radiation Hardness of Coplanar Submicron Gap Charge-Coupled Devices (CCD) with Rapid Thermal Nitrided Oxides
|
胡振國; Lee, G. C.; Hwu, Jenn-Gwo; Lee, G. C. |
| 臺大學術典藏 |
2020-06-11T06:42:09Z |
Radiation hardness of fluorinated oxides prepared by Liquid phase deposition method following rapid thermal oxidation
|
Lu, W.-S.;Chou, J.-S.;Lee, S.-C.;Hwu, J.-G.; Lu, W.-S.; Chou, J.-S.; Lee, S.-C.; Hwu, J.-G.; JENN-GWO HWU |
显示项目 706791-706800 / 2348419 (共234842页) << < 70675 70676 70677 70678 70679 70680 70681 70682 70683 70684 > >> 每页显示[10|25|50]项目
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