|
顯示項目 913776-913785 / 2348570 (共234857頁)
<< < 91373 91374 91375 91376 91377 91378 91379 91380 91381 91382 > >>
每頁顯示[10|25|50]項目
| 元智大學 |
Nov-15 |
Very high bit-rate distance product using high-power single-mode 850-nm VCSEL with discrete multitone modulation formasts through OM4 multimode fiber
|
I-Cheng Lu; Chia-Chien Wei; Hsing-Yu Chen; Kuan-Zhou Chen; Cheng-Hsiang Huang; Kai-Lun Chi; Jin-Wei Shi; Fang-I Lai; Dan-Hua Hsieh; Hao-Chung Kuo; Shi-Wei Chiu; Jyehong Chen |
| 國立交通大學 |
2015-07-21T08:27:47Z |
Very High Bit-Rate Distance Product Using High-Power Single-Mode 850-nm VCSEL With Discrete Multitone Modulation Formats Through OM4 Multimode Fiber
|
Lu, I-Cheng; Wei, Chia-Chien; Chen, Hsing-Yu; Chen, Kuan-Zhou; Huang, Cheng-Hsiang; Chi, Kai-Lun; Shi, Jin-Wei; Lai, Fan-I; Hsieh, Dan-Hua; Kuo, Hao-Chung; Lin, Wei; Chiu, Shi-Wei; Chen, Jyehong |
| 國立交通大學 |
2014-12-08T15:15:04Z |
Very high density (44 fF/mu m(2)) SrTiO3 MIM capacitors for RF applications
|
Chiang, K. C.; Lin, J. W.; Pan, H. C.; Hsiao, C. N.; Chen, W. J.; Kao, H. L.; Hsieh, I. J.; Chin, Albert |
| 中華大學 |
2007 |
Very High Density (44 fF/um2) SrTiO3 MIM Capacitors for RF Applications
|
謝英家; Hsieh, Ing-Jar |
| 國立交通大學 |
2014-12-08T15:25:25Z |
Very high density RF MIM capacitor compatible with VLSI
|
Chiang, KC; Lai, CH; Chin, A; Kao, HL; McAlister, SP; Chi, CC |
| 國立交通大學 |
2014-12-08T15:40:17Z |
Very high density RF MIM capacitors (17 fF/mu m(2) using high-kappa Al2O3 doped Ta2O5 dielectrics
|
Yang, MY; Huang, CH; Chin, A; Zhu, CX; Cho, BJ; Li, MF; Kwong, DL |
| 國立交通大學 |
2014-12-08T15:01:55Z |
Very high hole mobility in p-type Si/SiGe modulation-doped heterostructures
|
Tsai, WC; Chang, CY; Huang, GW; Fang, FF; Chang, YH; Huang, CF |
| 國立交通大學 |
2014-12-08T15:25:27Z |
Very high kappa and high density TiTaO MIM capacitors for analog and RF applications
|
Chiang, KC; Chin, A; Lai, CH; Chen, WJ; Cheng, CF; Hung, BF; Liao, CC |
| 國立交通大學 |
2017-04-21T06:49:54Z |
Very High Performance Non-Volatile Memory on Flexible Plastic Substrate
|
Cheng, C. H.; Chou, K. Y.; Chin, Albert; Yeh, F. S. |
| 國立成功大學 |
2003-06-15 |
Very high selective etching of GaAs/Al0.2Ga0.8As for gate recess process to pseudomorphic high electron mobility transistors (PHEMT) applications using citric buffer solution
|
Liao, Chin-I; Sze, Po-Wen; Houng, Mau-Phon; Wang, Yeong-Her |
顯示項目 913776-913785 / 2348570 (共234857頁)
<< < 91373 91374 91375 91376 91377 91378 91379 91380 91381 91382 > >>
每頁顯示[10|25|50]項目
|
