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Showing items 212961-212970 of 2348719 (234872 Page(s) Totally) << < 21292 21293 21294 21295 21296 21297 21298 21299 21300 21301 > >> View [10|25|50] records per page
| 國立交通大學 |
2019-04-02T05:58:22Z |
Atomic layer germanium etching for 3D Fin-FET using chlorine neutral beam
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Ohori, Daisuke; Fujii, Takuya; Noda, Shuichi; Mizubayashi, Wataru; Endo, Kazuhiko; Lee, En-Tzu; Li, Yiming; Lee, Yao-Jen; Ozaki, Takuya; Samukawa, Seiji |
| 臺大學術典藏 |
2021-08-21T23:58:56Z |
Atomic Layer Nucleation Engineering: Inhibitor-Free Area-Selective Atomic Layer Deposition of Oxide and Nitride
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Chou, Chun Yi; Lee, Wei Hao; Chuu, Chih Piao; Chen, Tse An; Hou, Cheng Hung; Yin, Yu Tung; Wang, Ting Yun; Shyue, Jing Jong; Li, Lain Jong; MIIN-JANG CHEN |
| 臺大學術典藏 |
2022-03-22T08:27:46Z |
Atomic Layer Nucleation Engineering: Inhibitor-Free Area-Selective Atomic Layer Deposition of Oxide and Nitride
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Chou C.-Y;Lee W.-H;Chuu C.-P;Chen T.-A;Hou C.-H;Yin Y.-T;Wang T.-Y;Shyue J.-J;Li L.-J;Chen M.-J.; Chou C.-Y; Lee W.-H; Chuu C.-P; Chen T.-A; Hou C.-H; Yin Y.-T; Wang T.-Y; Shyue J.-J; Li L.-J; Chen M.-J.; MIIN-JANG CHEN |
| 臺大學術典藏 |
2022-03-22T08:30:45Z |
Atomic Layer Nucleation Engineering: Inhibitor-Free Area-Selective Atomic Layer Deposition of Oxide and Nitride
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Chou C.-Y;Lee W.-H;Chuu C.-P;Chen T.-A;Hou C.-H;Yin Y.-T;Wang T.-Y;Shyue J.-J;Li L.-J;Chen M.-J.; Chou C.-Y; Lee W.-H; Chuu C.-P; Chen T.-A; Hou C.-H; Yin Y.-T; Wang T.-Y; Shyue J.-J; Li L.-J; Chen M.-J.; MIIN-JANG CHEN |
| 臺大學術典藏 |
2022-03-22T08:30:47Z |
Atomic Layer Nucleation Engineering: Inhibitor-Free Area-Selective Atomic Layer Deposition of Oxide and Nitride
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Chou C.-Y;Lee W.-H;Chuu C.-P;Chen T.-A;Hou C.-H;Yin Y.-T;Wang T.-Y;Shyue J.-J;Li L.-J;Chen M.-J.; Chou C.-Y; Lee W.-H; Chuu C.-P; Chen T.-A; Hou C.-H; Yin Y.-T; Wang T.-Y; Shyue J.-J; Li L.-J; Chen M.-J.; MIIN-JANG CHEN |
| 元智大學 |
Sep-18 |
Atomic Layer Oxidation on Graphene Sheets for Tuning Their Oxidation Levels, Electrical Conductivities, and Band Gaps
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S. Gu; Chien-Te Hsieh; T.-W. Lin; C.-Y. Yuan; Y. Ashraf Gandomi; J.-K. Chang; J. Li |
| 國立交通大學 |
2019-04-02T05:58:34Z |
Atomic layer oxidation on graphene sheets for tuning their oxidation levels, electrical conductivities, and band gaps
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Gu, Siyong; Hsieh, Chien-Te; Lin, Tzu-Wei; Yuan, Chun-Yao; Gandomi, Yasser Ashraf; Chang, Jeng-Kuei; Li, Jianlin |
| 國立交通大學 |
2020-10-05T02:01:09Z |
Atomic Layer-Deposited Al-Doped ZnO Thin Films for Display Applications
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Dimitrov, Dimitre; Tsai, Che-Liang; Petrov, Stefan; Marinova, Vera; Petrova, Dimitrina; Napoleonov, Blagovest; Blagoev, Blagoy; Strijkova, Velichka; Hsu, Ken Yuh; Lin, Shiuan Huei |
| 國立交通大學 |
2019-04-03T06:42:33Z |
Atomic mechanism of polarization-controlled surface reconstruction in ferroelectric thin films
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Gao, Peng; Liu, Heng-Jui; Huang, Yen-Lin; Chu, Ying-Hao; Ishikawa, Ryo; Feng, Bin; Jiang, Ying; Shibata, Naoya; Wang, En-Ge; Ikuhara, Yuichi |
| 國立臺灣科技大學 |
2014 |
Atomic mechanism of the semiconducting-to-metallic phase transition in single-layered MoS 2
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Lin, Y.-C.;Dumcenco, D.O.;Huang, Y.-S.;Suenaga, K. |
Showing items 212961-212970 of 2348719 (234872 Page(s) Totally) << < 21292 21293 21294 21295 21296 21297 21298 21299 21300 21301 > >> View [10|25|50] records per page
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