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Showing items 466476-466485 of 2315029 (231503 Page(s) Totally)
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| 國立臺灣大學 |
2004 |
High-k Al2O3 gate dielectrics prepared by oxidation of aluminum film in nitric acid followed by high-temperature annealing
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Kuo, Chih-Sheng; Hsu, Jui-Feng; Huang, Szu-Wei; Lee, Lurng-Shehng; Tsai, Ming-Jinn; Hwu, Jenn-Gwo |
| 國立交通大學 |
2014-12-08T15:44:05Z |
High-k cobalt-titanium oxide dielectrics formed by oxidation of sputtered Co/Ti or Ti/Co films
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Pan, TM; Lei, TF; Chao, TS |
| 國立臺灣科技大學 |
2008 |
High-K dielectric PZN-based materials prepared by microwave sintering for reduction of defects
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C.L. Li; C.C. Chou; H.F. Cheng |
| 國立臺灣科技大學 |
2008 |
High-K dielectric PZN-based materials prepared by microwave sintering for reduction of defects
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Li, C.L.;Chou, C.C.;Cheng, H.F. |
| 國立成功大學 |
2014-04 |
High-k dielectrics on (100) and (110) n-InAs: Physical and electrical characterizations
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Wang, C. H.; Doornbos, G.; Astromskas, G.; Vellianitis, G.; Oxland, R.; Holland, M. C.; Huang, M. L.; Lin, C. H.; Hsieh, C. H.; Chang, Y. S.; Lee, T. L.; Chen, Y. Y.; Ramvall, P.; Lind, E.; Hsu, W. C.; Wernersson, L. -E.; Droopad, R.; Passlack, M.; Diaz, C. H. |
| 臺大學術典藏 |
2018-09-10T14:54:42Z |
High-k polymer-graphene oxide dielectrics for low-voltage flexible nonvolatile transistor memory devices
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Chou, Y.-H.; Chiu, Y.-C.; Chen, W.-C.; WEN-CHANG CHEN |
| 國立交通大學 |
2014-12-08T15:33:35Z |
High-k shallow traps observed by charge pumping with varying discharging times
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Ho, Szu-Han; Chang, Ting-Chang; Lu, Ying-Hsin; Wang, Bin-Wei; Lo, Wen-Hung; Chen, Ching-En; Tsai, Jyun-Yu; Chen, Hua-Mao; Liu, Kuan-Ju; Tseng, Tseung-Yuen; Cheng, Osbert; Huang, Cheng-Tung; Chen, Tsai-Fu; Cao, Xi-Xin |
| 國立成功大學 |
2013-11-07 |
High-k shallow traps observed by charge pumping with varying discharging times
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Ho, Szu-Han;Chang, Ting-Chang;Lu, Ying-Hsin;Wang, Bin-Wei;Lo, Wen-Hung;Chen, Ching-En;Tsai, Jyun-Yu;Chen, Hua-Mao;Liu, Kuan-Ju;Tseng, Tseung-Yuen;Cheng, Osbert;Huang, Cheng-Tung;Chen, Tsai-Fu;Cao, Xi-Xin |
| 中華大學 |
2010 |
High-k TiCeO MIM Capacitors with a Dual-Plasma Interface Treatment
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謝英家; Hsieh, Ing-Jar |
| 國立交通大學 |
2014-12-12T01:55:03Z |
High-k/Metal Gate 與 SOI金氧半場效電晶體RTN分析與可靠度的研究
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羅弘聘; Luo,Hong-Ping; 張鼎張; Chang,Ting-Chang |
Showing items 466476-466485 of 2315029 (231503 Page(s) Totally)
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